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5 of 5 people found the following review helpful:
1.0 out of 5 stars Surprisingly bad, September 10, 2002
By A Customer
This review is from: Chemical Mechanical Planarization of Microelectronic Materials (Hardcover)
There are so many errors in this book that I cannot imagine how can anybody rely on any information contained here. The book is probably simply showing the current understanding of CMP, which is poor, but this still cannot justify bluntly bad science. The authors describe all important concepts of CMP like Preston equation, Pourbaix diagrams, but fail to clearly show the limited scope of their usefulness. They do not understand thermodynamics vs. kinetics of chemical processes either. At least half of the chemical equations are wrong, another quarter should not be there in the form presented. Who reviewed this book before publishing?
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5 of 6 people found the following review helpful:
3.0 out of 5 stars Not a very good one, April 17, 2000
By A Customer
This review is from: Chemical Mechanical Planarization of Microelectronic Materials (Hardcover)
This area is short of research even though lots of work has been done. This book gives an overview of CMP process, including Cu, W and SiO2.
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Chemical Mechanical Planarization of Microelectronic Materials
Chemical Mechanical Planarization of Microelectronic Materials by Joseph M. Steigerwald (Hardcover - February 10, 1997)
$163.00 $135.70
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