This text provides coverage of the models, governing equations and numerical techniques suitable for process simulation. It concentrates on such areas as chemical vapour deposition, metal-organic chemical vapour deposition, plasma processing, rapid thermal processing and crystal growth, as well as defining the basic principles of transport phenomena, gas phase and surface reactions in electronics materials processing. In addition, it explains how to apply practical numerical techniques used in process simulation, and presents the numerical methods necessary to produce simulation codes. The work is intended for those new to the field of process and equipment simulation in electronics materials processing, and also for the experienced modeller. It also contains coverage suitable for graduate students in materials science, and chemical, mechanical and electrical engineering.
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Most Helpful Customer Reviews
2 of 2 people found the following review helpful:
4.0 out of 5 stars
A good intro to semiconductor process modeling,
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Amazon Verified Purchase(What's this?)
This review is from: Computational Modeling in Semiconductor Processing (The Artech House Materials Science Library) (Hardcover)
This is a six chapter book, with six authors. As a result, the treatment of the subject matter is a bit uneven. Here is a snap shot of the chapters:Chap 1 (Meyyappan) is a very general introduction Chap 2 (Govindan & de Jong) reviews numerical methods. It is a good intro, but focuses on the finite difference method which isn't widely used (compared to the finite element and finite volume methods) Chap 3 (Chan) focuses on crystal growth. It seems very comprehensive, but I am not an expert in this area Chap 4 (Kleijn) is on chemical vapor deposition. This chapter is incredibly comprehensive and brilliantly written. Pretty much every aspect of CVD modeling is covered. This book is worth buying just for this chapter. Chap 5 (Meyyappan) on plasma processes is a good introduction to the subject. Plasma modeling is incredibly complex and this chapter shows many simplifications used to make the problem tractable. Chap 6 (Campbell). A very clear and readable description of modeling techniques used in Rapid Thermal Annealing. The book provides enough information to understand the modeling methods used and where they are applied. It probably doesn't provide enough information to write your own programs.
2 of 2 people found the following review helpful:
5.0 out of 5 stars
Good book,
By A Customer
This review is from: Computational Modeling in Semiconductor Processing (The Artech House Materials Science Library) (Hardcover)
This book includes almost everything that need to be considered in simulating the semiconductor processing, especially the CVD process and crystal growth. Perfect!
1 of 1 people found the following review helpful:
5.0 out of 5 stars
Very practical book,
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Amazon Verified Purchase(What's this?)
This review is from: Computational Modeling in Semiconductor Processing (The Artech House Materials Science Library) (Hardcover)
I was able to reply to a certain consulting
in semiconductor manufacturing site by reading this book, Chapter 4. It's very informative and worth buying widely for scientists and engineers.
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Inside This Book
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First Sentence:
The current worldwide electronics market is estimated to be in the range of $900 billion and is expected to reach $2 trillion by the turn of the century [1]. Read the first page Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Monte Carlo, John Wiley, Academic Press, Electrochemical Society, Plasma Science, Heat Mass Transfer, Journal of Fluid Mechanics, Materials Research Society, Thin Solid Films, Model Features, Cryst Growth, National Laboratories, North Holland Publ, Physical Review, The Netherlands, Cambridge University Press, Clarendon Press, Hemisphere Publ, Noyes Publications, Quantum Chemistry Program Exchange, Park Ridge, Pergamon Press, Plenum Press, San Diego New!
Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
The current worldwide electronics market is estimated to be in the range of $900 billion and is expected to reach $2 trillion by the turn of the century [1]. Read the first page Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Monte Carlo, John Wiley, Academic Press, Electrochemical Society, Plasma Science, Heat Mass Transfer, Journal of Fluid Mechanics, Materials Research Society, Thin Solid Films, Model Features, Cryst Growth, National Laboratories, North Holland Publ, Physical Review, The Netherlands, Cambridge University Press, Clarendon Press, Hemisphere Publ, Noyes Publications, Quantum Chemistry Program Exchange, Park Ridge, Pergamon Press, Plenum Press, San Diego New!
Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 73
books:
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9
books
cite this book:
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- Chemical Vapor Deposition (06682G) by Jong-Hee Park on page 216, page 222, and page 318
- Transport Phenomena, 2nd Edition by R. Byron Bird on page 91, page 217, and page 320
- Solid State Physics: Advances in Research and Applications, Vol. 32 by Henry Ehrenreich on page 92, and Back Matter
- Computer Simulation Using Particles by R.W Hockney on page 24, and page 319
- Solid State Physics: Advances in Research and Applications, Vol. 44 by Henry Ehrenreich on page 92, and Back Matter
See all 73 books this book cites
- The Science and Engineering of Microelectronic Fabrication by Stephen A. Campbell on page 144
- Computational Fluid Dynamics by T. J. Chung on page 954
- Principles and Analysis of Aigaas/Gaas Heterojuntion Bipolar Transistors (Solid State Technology) by Juin J. Liou in Front Matter
- Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies (NATO Science Series II: Mathematics, Physics and Chemistry) by Y. Pauleau on page 139
- Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies (NATO Science Series II: Mathematics, Physics and Chemistry) by Yves Pauleau on page 139
See all 9 books citing this book
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