Customer Reviews

Computational Modeling in Semiconductor Processing (The Artech House Materials Science Library)

5 star:		(2)
4 star:		(1)
3 star:		(0)
2 star:		(0)
1 star:		(0)

 

 

This is a six chapter book, with six authors. As a result, the treatment of the subject matter is a bit uneven. Here is a snap shot of the chapters:
Chap 1 (Meyyappan) is a very general introduction
Chap 2 (Govindan & de Jong) reviews numerical methods. It is a good intro, but focuses on the finite difference method which isn't widely used (compared to the finite element and finite volume methods)
Chap 3 (Chan) focuses on crystal growth. It seems very comprehensive, but I am not an expert in this area
Chap 4 (Kleijn) is on chemical vapor deposition. This chapter is incredibly comprehensive and brilliantly written. Pretty much every aspect of CVD modeling is covered. This book is worth buying just for this chapter.
Chap 5 (Meyyappan) on plasma processes is a good introduction to the subject. Plasma modeling is incredibly complex and this chapter shows many simplifications used to make the problem tractable.
Chap 6 (Campbell). A very clear and readable description of modeling techniques used in Rapid Thermal Annealing.

The book provides enough information to understand the modeling methods used and where they are applied. It probably doesn't provide enough information to write your own programs.

This book includes almost everything that need to be considered in simulating the semiconductor processing, especially the CVD process and crystal growth. Perfect!

I was able to reply to a certain consulting

in semiconductor manufacturing site by reading

this book, Chapter 4.

It's very informative and worth buying widely

for scientists and engineers.