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Crystal Growth Technology [Hardcover]

Hans J. Scheel (Author), Tsuguo Fukuda (Author)


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Book Description

0471490598 978-0471490593 November 14, 2003 1
This volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production.

The major industrial crystals are treated: Si, GaAs, GaP, InP, CdTe, sapphire, oxide and halide scintillator crystals, crystals for optical, piezoelectric and microwave applications and more.

Contains 29 contributions from leading crystal technologists covering the following topics:
* General aspects of crystal growth technology
* Silicon
* Compound semiconductors
* Oxides and halides
* Crystal machining
* Epitaxy and layer deposition

Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centers.

In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences.

Editorial Reviews

Review

"...represents a milestone in the literature of crystal growth and it should be in every science or engineering library..." (Progress in Crystal Growth and Characterization of Materials, 2003)

From the Back Cover

This volume deals with the technologies of crystal fabrication, of crystal machining, and of epilayer production and is the first book on industrial and scientific aspects of crystal and layer production. Highest-quality crystals and epitaxical layers form the base for many of industries technological advances, including telecommunication, computer and electric energy technology, and those technologies based on lasers and nonlinear-optic crystals. Furthermore, automobile electronics, audiovisual equipment and infrared night-vision all depend on high-quality crystals and epilayers, as do novel technologies currently in development and planned for the future.

This book contains 29 contributions of leading crystal technologists covering the following topics:

  • General aspects of crystal growth technology
  • Silicon
  • Compound semiconductors
  • Oxides and halides
  • Crystal machining
  • Epitaxy and layer deposition

Scientific and technological problems of production and machining of industrial crystals are discussed by top experts, most of them from the major growth industries and crystal growth centres.

It is anticipated that this volume will serve all scientists and engineers involved in crystal and epilayer fabrication. In addition, it will be useful for the users of crystals, for teachers and graduate students in materials sciences, in electronic and other functional materials, chemical and metallurgical engineering, micro-and optoelectronics including nanotechnology, mechanical engineering and precision-machining, microtechnology, and in solid-state sciences. Also consultants and specialists will profit from this book, as will those interested in crystals, epilayers, and their production for saving energy (GaN- and SiC-based high-power electronics and light-emitting diodes for illumination) and for renewable energy sources (economic high-efficiency solar cells and forthcoming laser-fusion energy).


Product Details

  • Hardcover: 694 pages
  • Publisher: Wiley; 1 edition (November 14, 2003)
  • Language: English
  • ISBN-10: 0471490598
  • ISBN-13: 978-0471490593
  • Product Dimensions: 9.2 x 6.3 x 1.6 inches
  • Shipping Weight: 2.4 pounds
  • Amazon Best Sellers Rank: #4,638,620 in Books (See Top 100 in Books)

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Inside This Book (learn more)
First Sentence:
The industrial production of crystals started with A. Verneuil with his flame-fusion growth method 1902. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
slicing rate, octahedral void defects, undercooling profiles, chemical vaporization machining, dendritic web growth, uniform activator distribution, silicon melt temperature, kinetic striations, melt free surface, interstep distances, striation problem, crystal growth technology, crystal machining, furnace temperature gradient, rotary electrode, axisymmetrical model, axisymmetrical case, kerf loss, conical crucible, machining gap, increasing boron concentration, accelerated crucible rotation technique, crucible rotation speed, oxide defect density, epitaxial growth modes
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Lai Krishan, New York, Elsevier Science, John Wiley, International Conference, Spring Meeting, Japan Society of Applied Physics, Academic Press, Isotherms Stream, Semiconductor Silicon, Electronic Materials, American Institute of Physics, Extended Abstract, International Symposium, Osaka University, Related Materials, Axial Distance, Graduate School of Engineering, Krishan Lai, Krishan Lal, New Delhi, North Holland, Publications Ltd, Solid State Phenom, Vacancy Path
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