Epitaxy: Physical Foundation and Technical Implementation [Hardcover]

Marian A. Herman (Author), W. Richter (Author), Helmut Sitter (Author)

Book Description

Publication Date: September 20, 2004 | ISBN-10: 3540678212 | ISBN-13: 978-3540678212 | Edition: 1

In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates, e.g. processes in which atoms of the growing film mimic the arrangement of the atoms of the substrate. Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review. A large part of this book focuses on the problems of heteroepitaxy. The most important epitaxial growth techniques which are currently widely used in basic research as well as in manufacturing processes of devices are presented and discussed in detail.

Editorial Reviews

Review

From the reviews:

"Epitaxy has become increasingly important … . Still, a good monograph on this issue was lacking …. This gap is finally filled with a book that finds a good equilibrium … . As such, it will be very useful to students who are interested in advanced thin film growth, and researchers active in the field of low-dimensional heterostructures. … Throughout the work, a large number of references are cited … . this book will be a good guide for people interested in the growth and properties of low dimensional heterostructures and nanostructures." (André Vantomme, Physicalia, Vol. 57 (3), 2005)

"The book … contains experimental and theoretical aspects of the epitaxial growth process including very recent developments in a compact and clear manner. … represents a good opportunity for the interested reader to get used to the field of epitaxial growth of materials and should be of high interest to students, scientists, and engineers working in the field of material research, device research, and solid state physics or –chemistry. … this book should become a indispensable source of information for all crystal growers." (V. Gottschalch, Zeitschrift für Kristallographie, Issue: 11, 2004)

"In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates … . Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review." (Zeitschrift für Kristallographie, Issue: 10, 2004)

From the Back Cover

Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy’s coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization. It is intended for undergraduate students, PhD students, research scientists, lecturers and practicing engineers interested in materials science, solid state electronics and crystal growth.

Product Details

• Hardcover: 537 pages
• Publisher: Springer; 1 edition (September 20, 2004)
• Language: English
• ISBN-10: 3540678212
• ISBN-13: 978-3540678212
• Product Dimensions: 9.3 x 6.5 x 0.9 inches
• Shipping Weight: 1.9 pounds (View shipping rates and policies)
• Amazon Best Sellers Rank: #666,723 in Books (See Top 100 in Books)
  • #58 in Books > Professional & Technical > Professional Science > Chemistry > Crystallography

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