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Ferroelectric Random Access Memories: Fundamentals and Applications (Topics in Applied Physics) [Hardcover]

Hiroshi Ishiwara (Editor), Masanori Okuyama (Editor), Yoshihiro Arimoto (Editor)


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Book Description

May 27, 2004 3540407189 978-3540407188 1
The book consists of 5 parts: (1) ferroelectric thin films, (2) deposition and characterization methods, (3) fabrication process and circuit design, (4) advanced-type memories, and (5) applications and future prospects; each part is further divided into several chapters. Because of the wide range of topics discussed, each chapter in this book was written by one of the best authors knowing the specific topic very well.

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From the Back Cover

In fabrication of FeRAMs, various academic and technological backgrounds are necessary, which include ferroelectric materials, thin film formation, device physics, circuit design, and so on.This book covers from fundamentals to applications of ferroelectric random access memories (FeRAMs). The book consists of 5 parts; (1) ferroelectric thin films, (2) deposition and characterization methods, (3) fabrication process and circuit design, (4) advanced-type memories, and (5) applications and future prospects, and each part is further devided in several chapters. Because of the wide range of the discussed topics, each chapter in this book was written by one of the best authors knowing the specific topic very well. Thus, this is a good introduction book of FeRAM for graduate students and new comers to this field, as well as it helps specialists to understand FeRAMs more deeply.

Product Details

  • Hardcover: 305 pages
  • Publisher: Springer; 1 edition (May 27, 2004)
  • Language: English
  • ISBN-10: 3540407189
  • ISBN-13: 978-3540407188
  • Product Dimensions: 9.3 x 6.1 x 0.9 inches
  • Shipping Weight: 1.2 pounds
  • Amazon Best Sellers Rank: #5,312,653 in Books (See Top 100 in Books)

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Inside This Book (learn more)
First Sentence:
The recent development of ferroelectric random access memories (FeRAMs) has shown that extremely high-density ferroelectric memory devices (ULSI) will become commercially feasible within the next few years [1,2,3]. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
dielectric microscopy, paraelectric layer, cell size factor, ferroelectric capacitor, nanoscale capacitors, piezoresponse images, dielectric imaging, data retention characteristics, ferroelectric film, switchable polarization, contactless interface, ferroelectric random access memories, ferroelectric thin films, polarization fatigue, remanent polarization, nanoscale phenomena, switched charge, imprint characteristics, leakage current density, ferroelectric memory, depolarization field, ferroelectric switching, polarization reversal, operational voltage, ferroelectric properties
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Paz de Araujo, Solid-State Circuits Conf, Springer-Verlag Berlin Heidelberg, Electron Devices Meeting, Curie von Schweidler, Frenkel Poole, New York, San Francisco, Sawyer Tower, Colorado Springs, Excessive Length, Tokyo Institute of Technology
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