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The recent development of ferroelectric random access memories (FeRAMs) has shown that extremely high-density ferroelectric memory devices (ULSI) will become commercially feasible within the next few years [1,2,3].
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Key Phrases - Statistically Improbable Phrases (SIPs):
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dielectric microscopy, paraelectric layer, cell size factor, ferroelectric capacitor, nanoscale capacitors, piezoresponse images, dielectric imaging, data retention characteristics, ferroelectric film, switchable polarization, contactless interface, ferroelectric random access memories, ferroelectric thin films, polarization fatigue, remanent polarization, nanoscale phenomena, switched charge, imprint characteristics, leakage current density, ferroelectric memory, depolarization field, ferroelectric switching, polarization reversal, operational voltage, ferroelectric properties
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Paz de Araujo, Solid-State Circuits Conf, Springer-Verlag Berlin Heidelberg, Electron Devices Meeting, Curie von Schweidler, Frenkel Poole, New York, San Francisco, Sawyer Tower, Colorado Springs, Excessive Length, Tokyo Institute of Technology
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