Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
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Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
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Most Helpful Customer Reviews
5 of 5 people found the following review helpful:
4.0 out of 5 stars
Good introductory book, too expensive,
By A Customer
This review is from: Glow Discharge Processes: Sputtering and Plasma Etching (Hardcover)
This is the ideal book for beginning students attempting to navigate the maze of plasma physics for the first time. The book concentrates on developing an intuitive feel for ionized gases while including enough real physics to back up the intuition with numbers. It's unfortunate that the publisher has priced this work out of the range of the average student for whom it would be so useful.
3 of 3 people found the following review helpful:
3.0 out of 5 stars
Mixed feelings,
By
This review is from: Glow Discharge Processes: Sputtering and Plasma Etching (Hardcover)
I wholeheartly recomend this book to someone just starting out in plasma processing. It is THE best introductory book on the subject. However, if you have read the literature and have been exposed to the subject for a while, you will find that the book is very basic and a little outdated. Chapman used to be the VP of Technology for a Plasma Etch firm when he wrote the 1st edition. Now he is (and has for some time been) President of a vacuumn diagnostics company. He really has not been updating this. With that caveat, if the other books/literature is "over your head" - go to this book for simply to understand explanations of so called "low temperature" plasma phenemena.
3 of 3 people found the following review helpful:
4.0 out of 5 stars
Great fundamental reference,
By "rteal6" (PA) - See all my reviews
This review is from: Glow Discharge Processes: Sputtering and Plasma Etching (Hardcover)
While the specifics of various systems is dated, this is a great reference for the basics of plasma processing. Even though the equipment I use today is significantly more advanced I continually refer to this work for baseline information. The explanations are clear and well written. A rare example of a reference / textbook one can actually read.
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Inside This Book
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First Sentence:
In all the plasma processes discussed in this book, namely deposition and etching by physical sputtering and by plasma enhanced chemistry, the gaseous environment plays a major role. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
bias evaporation, sputter ejection, hot filament discharge, target sheath, dark space thickness, sputtering yield data, bias sputtering, sheath voltage, anode sheath, secondary electron coefficient, sputtering discharge, cathode sheath, plasma etching system, triode systems, energy transfer function, silicon etch rate, glow discharge processes, plasma potential, space charge sheath, sputtering system, substrate platform, floating substrate, thin film adhesion, glow region, etching species Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Solid State Tech, Thin Solid Films, Architecture of the Discharge, Ionized Gases, Thin Film Processes, Bias Techniques, Handbook of Thin Film Technology, Deposition of Multicomponent Materials, John Coburn New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
In all the plasma processes discussed in this book, namely deposition and etching by physical sputtering and by plasma enhanced chemistry, the gaseous environment plays a major role. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
bias evaporation, sputter ejection, hot filament discharge, target sheath, dark space thickness, sputtering yield data, bias sputtering, sheath voltage, anode sheath, secondary electron coefficient, sputtering discharge, cathode sheath, plasma etching system, triode systems, energy transfer function, silicon etch rate, glow discharge processes, plasma potential, space charge sheath, sputtering system, substrate platform, floating substrate, thin film adhesion, glow region, etching species Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Solid State Tech, Thin Solid Films, Architecture of the Discharge, Ionized Gases, Thin Film Processes, Bias Techniques, Handbook of Thin Film Technology, Deposition of Multicomponent Materials, John Coburn New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 13
books:
See all 13 books this book cites
11
books
cite this book:
See all 11 books citing this book
- Thin Film Processes by John L. Vossen on 5 pages
- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on 4 pages
- Gaseous Electronics. Volume 1: Electrical Discharges. by M. Hirsh on page 135, and page 173
- Ionized Gases (AVS Classics in Vacuum Science and Technology) by A.von Engel on page 46, and page 133
- Physical Electronics by C.L. Hemenway on page 134, and page 288
See all 13 books this book cites
- Glow Discharge Optical Emission Spectrometry by Richard Payling on page 111, and page 271
- Low Temperature Plasma Physics: Fundamental Aspects and Applications by Rainer Hippler on page 451
- Plasma Deposition, Treatment, and Etching of Polymers: The Treatment and Etching of Polymers (Plasma-Materials Interactions) by Riccardo d'Agostino in Back Matter
- Thin-Film Deposition: Principles and Practice by Donald Smith on page 556
- Semiconductor Nanostructures for Optoelectronic Applications (Artech House Semiconductor Materials and Devices Library) by Todd D. Steiner on page 42
See all 11 books citing this book
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