A comprehensive overview of chemical vapor deposition (CVD), an extremely versatile process for manufacturing coatings, powders, fibers, and monolithic components.
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Editorial Reviews
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".presents an objective and systematic assessment." - High Tech Ceramics News
--This text refers to an alternate
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About the Author
Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition
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Inside This Book
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First Sentence:
Chemical vapor deposition (CVD) is a very versatile process used in the production of coatings, powders, fibers and monolithic components. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
deposition temperature range, gas phase precipitation, gallium arsenic phosphide, hafnium carbide, chemical vapor infiltration, refractory metal silicides, hydrogen reduction, carbonyl halides, boron source, isotropic carbon, deposition reaction, low electrical resistivity, cemented carbide tools, oxidation protection, boron fibers, vapor deposition, photovoltaic materials, epitaxial silicon, single crystal diamond, deposition apparatus, semiconductor applications, trimethyl aluminum, silicon source, acetyl acetonate, aluminum arsenide Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Thin Solid Films, Semiconductor International, European Conf, John Wiley, Academic Press, Noyes Publications, Park Ridge, Electrochem Soc, Electrochemical Soc, Less Common Metals, Solid State Technology, Surface Modification Technologies, Tubular Reactor, Ceramic Bulletin, Chapters Five, Chip Fabrication, Colorless Very, High Press, High Temp, Palo Alto, Selected Properties of Metal Carbonyls, White Octahedral Volatile New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Chemical vapor deposition (CVD) is a very versatile process used in the production of coatings, powders, fibers and monolithic components. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
deposition temperature range, gas phase precipitation, gallium arsenic phosphide, hafnium carbide, chemical vapor infiltration, refractory metal silicides, hydrogen reduction, carbonyl halides, boron source, isotropic carbon, deposition reaction, low electrical resistivity, cemented carbide tools, oxidation protection, boron fibers, vapor deposition, photovoltaic materials, epitaxial silicon, single crystal diamond, deposition apparatus, semiconductor applications, trimethyl aluminum, silicon source, acetyl acetonate, aluminum arsenide Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Thin Solid Films, Semiconductor International, European Conf, John Wiley, Academic Press, Noyes Publications, Park Ridge, Electrochem Soc, Electrochemical Soc, Less Common Metals, Solid State Technology, Surface Modification Technologies, Tubular Reactor, Ceramic Bulletin, Chapters Five, Chip Fabrication, Colorless Very, High Press, High Temp, Palo Alto, Selected Properties of Metal Carbonyls, White Octahedral Volatile New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 22
books:
See all 22 books this book cites
- Chemical Vapor Deposition by Spear on 24 pages
- Chemical Vapor Deposition (06682G) by Jong-Hee Park on 6 pages
- Thin Film Processes by John L. Vossen on page 46, page 121, and page 260
- Fine Ceramics by Shinroku Saito on page 266, and page 320
- High Temperature Materials and Technology (Electrochemical Society) by I.E. Campbell on page 191, and page 383
See all 22 books this book cites
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