Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
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Editorial Reviews
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".presents an objective and systematic assessment." - High Tech Ceramics News
About the Author
Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition
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Inside This Book
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First Sentence:
Chemical vapor deposition (CVD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
deposition temperature range, interstitial nitrides, arsenic phosphide, most chemical reagents, interstitial carbides, hafnium carbide, hafnium nitride, chemical vapor infiltration, isotropic carbon, carbonyl halides, tungsten deposition, refractory metal silicides, deposition reaction, hydrogen reduction, boron source, silicon epitaxy, refractory carbides, zirconium carbide, niobium carbide, chemical vapor deposition, epitaxial silicon, oxidation protection, silicon source, acetyl acetonate, trimethyl aluminum Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Solid State Technology, Semiconductor International, Thin Solid Films, X-ray Density, Noyes Publications, John Wiley, Technical Brochure, Heat of Formation, Space Group, Park Ridge, Pearson Symbol, Superconductive Transition Temperature, Debye Temperature, European Conf, Ceramic Bulletin, Academic Press, Elsevier Science Publishers, Shear Modulus, Bulk Modulus, Lattice Parameter, Photonic Spectra, Compressive Strength, Electrochem Soc, Plasma Enhanced New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Chemical vapor deposition (CVD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
deposition temperature range, interstitial nitrides, arsenic phosphide, most chemical reagents, interstitial carbides, hafnium carbide, hafnium nitride, chemical vapor infiltration, isotropic carbon, carbonyl halides, tungsten deposition, refractory metal silicides, deposition reaction, hydrogen reduction, boron source, silicon epitaxy, refractory carbides, zirconium carbide, niobium carbide, chemical vapor deposition, epitaxial silicon, oxidation protection, silicon source, acetyl acetonate, trimethyl aluminum Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Solid State Technology, Semiconductor International, Thin Solid Films, X-ray Density, Noyes Publications, John Wiley, Technical Brochure, Heat of Formation, Space Group, Park Ridge, Pearson Symbol, Superconductive Transition Temperature, Debye Temperature, European Conf, Ceramic Bulletin, Academic Press, Elsevier Science Publishers, Shear Modulus, Bulk Modulus, Lattice Parameter, Photonic Spectra, Compressive Strength, Electrochem Soc, Plasma Enhanced New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 22
books:
See all 22 books this book cites
2
books
cite this book:
- Chemical Vapor Deposition by Spear on 28 pages
- Chemical Vapor Deposition (06682G) by Jong-Hee Park on 8 pages
- Fine Ceramics by Shinroku Saito on page 82, page 172, and page 253
- Thin Film Processes by John L. Vossen on page 41, page 145, and page 170
- Solar Energy (Look Inside) by Sheila Kaplan on page 82, and page 171
See all 22 books this book cites
- RF MEMS: Theory, Design, and Technology by Gabriel M. Rebeiz in Back Matter
- Organosilicon Chemistry 4: From Molecules to Materials by Norbert Auner on page 811
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