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Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology)
 
 
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Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology) [Hardcover]

Donald M. Mattox (Author)
4.2 out of 5 stars  See all reviews (6 customer reviews)


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Hardcover, December 17, 2007 --  
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Handbook of Physical Vapor Deposition (PVD) Processing, Second Edition Handbook of Physical Vapor Deposition (PVD) Processing, Second Edition 4.2 out of 5 stars (6)
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Book Description

0815514220 978-0815514220 December 17, 2007 1
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications.

The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.

The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.


Editorial Reviews

Review

If you are new to PVD as I am, you will find this book to be well worth the money. - Amazon.com Review

About the Author

Donald M. Mattox, together with his wife, Vivienne, are the founders of Management Plus, Inc. He is also the Technical Director of the Society of Vacuum Coaters (SVC). Mattox writes a monthly column on PVD processing and vacuum/plasma technology for the American Electroplating and Surface Finishing (AESP) Society journal, Plating and Surface Finishing. Since 1992, he has also been Technical Director of the Association of Vacuum Equipment Manufacturers (AVEM). Mattox was a staff member at Sandia National Laboratories for twenty-eight years. He is the inventor of the "ion plating" process. In addition, he was past president of the American Vacuum Society, Chairman of the Thin Film Division, Member of the Board of Directors, and associate editor of the Journal of Vacuum Science and Technology. Mattox is author of over 100 journal publications and several book chapters.


Product Details

  • Hardcover: 944 pages
  • Publisher: William Andrew; 1 edition (December 17, 2007)
  • Language: English
  • ISBN-10: 0815514220
  • ISBN-13: 978-0815514220
  • Product Dimensions: 9.4 x 6.8 x 2.6 inches
  • Shipping Weight: 3.2 pounds
  • Average Customer Review: 4.2 out of 5 stars  See all reviews (6 customer reviews)
  • Amazon Best Sellers Rank: #1,871,277 in Books (See Top 100 in Books)

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Customer Reviews

6 Reviews
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Average Customer Review
4.2 out of 5 stars (6 customer reviews)
 
 
 
 
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1 of 1 people found the following review helpful:
5.0 out of 5 stars Great reference book on PVD, May 12, 2009
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This review is from: Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology) (Hardcover)
I received the book very quickly. It is in great shape as it was reported to be. I am very happy to have the book and the seller was very easy to work with. I would buy another book from them.
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1 of 1 people found the following review helpful:
5.0 out of 5 stars the bible of pvd engineers, July 24, 2001
This review is from: Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology) (Hardcover)
i am a pvd engineer. the contennt of this book includes everything i want to know. if enginners can have this book, they do not need to spend much time searching tech. information in front of pc. it is a handbook for sure. i can not wait to own one!!
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3.0 out of 5 stars A bit diappointed, September 11, 2011
The text is full of typos. Yes it does cover a myriad of topics and but it does so in a superficial manner and with plenty of mistakes. I bought the book for over $200, in my opinion I should have paid at most half of that.

Despite this, it is an informative resource to have around, and would highly recommend it if not for its artificial blunders.

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Inside This Book (learn more)
First Sentence:
Surface engineering involves changing the properties of the surface and near-surface region in a desirable way. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
postvaporization ionization, depositing film material, concurrent energetic particle bombardment, deposited film material, chemical vapor precursors, concurrent bombardment, reflected high energy neutrals, reactive deposition processes, plasma generation region, drum fixture, residual film stress, concurrent ion bombardment, position equivalency, pumping manifold, substrate fixture, arc vapor deposition, reactive sputter deposition, auxiliary plasma, cast iron grit, depositing adatoms, vaporization source, pumping stack, cathodic arc source, vapor phase nucleation, ion plating process
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Society of Vacuum Coaters, Annual Technical Conference, Noyes Publications, Academic Press, Thin Solid Films, Solid State Technol, Institute of Physics Publishing, John Wiley, Handbook of Thin Film Process Technology, Gas Distribution System Components, Handbook of Plasma Processing Technology, Metal Finishing, Materials Characterization, Pergamon Press, Auger Electron Spectroscopy, Marcel Dekker, Metals Handbook, Practical Guide, X-ray Photoelectron Spectroscopy, Physics Today, American Vacuum Society, Materials of High Vacuum Technology, National Symposium, Reinhold Publishing, Scanning Electron Microscopy
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