This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
FREE Two-Day Shipping for Students. Learn more |
Book Description
Editorial Reviews
Review
". ..a useful addition..."-Adv. Mater. "...a unique collection of current knowledge. . ,,- Technische Rundschau. an invaluable reference..."-Optics & Photonics News.
Book Description
An extensive update of the many improvements in deposition technologies, mechanisms, and applications
Product Details
Would you like to update product info or give feedback on images?
|
Customer Reviews
|
Share your thoughts with other customers:
|
||||||||||||||||||||||
|
Most Helpful Customer Reviews
2 of 2 people found the following review helpful:
4.0 out of 5 stars
Basic thin films world,
By A Customer
This review is from: Handbook of Deposition Technologies for Films and Coatings, 2nd Ed., Second Edition: Science, Applications and Technology (Materials Science and ... Electronic Materials and Process Technology) (Hardcover)
This book is wonderful book for not only materials scientists but also semiconductor engineers to build the basic concept of the thin film deposition and coating. If you need a basic data or theory of the thin film deposition, I really recommend this book.
Share your thoughts with other customers: Create your own review
|
|
Inside This Book
(learn more)
First Sentence:
Historically, from the late 1950sonward, decorative coatingsoraluminum provided the initial thrustfor surface-engineered products fortoys, textiles, etc. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
detonation gun coatings, surface kinetics control, atomistic deposition processes, chemical ion plating, gaseous anodization, reactive evaporation process, microthrowing power, concurrent bombardment, inert gas shroud, ion plating process, reactive ion plating, pulse plating, cathode fall region, bombarding species, activated reactive evaporation, chemical etch rate, reactive sputtering process, plasma uniformity, alloy deposits, diode discharge, high energy neutrals, substrate bombardment, sputter deposition processes, magnetron sputtering source, energetic particle bombardment Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Metal Finishing, John Wiley, Plenum Press, Fizika Metall, Thin Film Processes, Solid State Technol, Book Company, Modern Electroplating, North Holland, Physics of Thin Films, Room Temp, Noyes Publications, Robert Draper, Soviet Phys, Bureau of Standards, Jet Process Corporation, Methyl Red, Reinhold Publ, Super D-Gun, Vacuum Metallurgy, Current Topics, Dept of Commerce, Faraday's Laws New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Surprise Me!
Historically, from the late 1950sonward, decorative coatingsoraluminum provided the initial thrustfor surface-engineered products fortoys, textiles, etc. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
detonation gun coatings, surface kinetics control, atomistic deposition processes, chemical ion plating, gaseous anodization, reactive evaporation process, microthrowing power, concurrent bombardment, inert gas shroud, ion plating process, reactive ion plating, pulse plating, cathode fall region, bombarding species, activated reactive evaporation, chemical etch rate, reactive sputtering process, plasma uniformity, alloy deposits, diode discharge, high energy neutrals, substrate bombardment, sputter deposition processes, magnetron sputtering source, energetic particle bombardment Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Metal Finishing, John Wiley, Plenum Press, Fizika Metall, Thin Film Processes, Solid State Technol, Book Company, Modern Electroplating, North Holland, Physics of Thin Films, Room Temp, Noyes Publications, Robert Draper, Soviet Phys, Bureau of Standards, Jet Process Corporation, Methyl Red, Reinhold Publ, Super D-Gun, Vacuum Metallurgy, Current Topics, Dept of Commerce, Faraday's Laws New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Surprise Me!
Citations (learn more)
This book cites 75
books:
See all 75 books this book cites
- Thin Film Processes by John L. Vossen on 9 pages
- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on 5 pages
- Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18) by Maurice H. Francombe on 4 pages
- Materials Science Pb by J C Anderson on page 235, page 247, and page 734
- Theory and Practice of Pulse Plating by Jean-Claude Puippe on page 506, page 581, and page 586
See all 75 books this book cites
Books on Related Topics
(learn more)
|
What Other Items Do Customers Buy After Viewing This Item?
Tags Customers Associate with This Product(What's this?)Click on a tag to find related items, discussions, and people.
|
Sell a Digital Version of This Book in the Kindle Store
If you are a publisher or author and hold the digital rights to a book, you can sell a digital version of it in our Kindle Store.
Learn more
Customer Discussions
|
This product's forum
Active discussions in related forums
Search Customer Discussions
|
Related forums
|
Listmania!
So You'd Like to...
Look for Similar Items by Category
- Books > Computers & Technology > Hardware > Microprocessors & System Design
- Books > Education & Reference
- Books > New & Used Textbooks > Engineering > Chemical Engineering
- Books > New & Used Textbooks > Reference
- Books > New & Used Textbooks > Science & Mathematics > Physics
- Books > Professional & Technical > Engineering
- Books > Science & Math > Physics
