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Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions (Materials Science and Process Technology) [Hardcover]

Stephen M. Rossnagel (Author), William D. Westwood (Author), Jerome J. Cuomo (Author)
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Book Description

Publication Date: January 14, 1991 | ISBN-10: 0815512201 | ISBN-13: 978-0815512202 | Edition: 1
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

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Customers buy this book with Principles of Plasma Discharges and Materials Processing , 2nd Edition by Michael A. Lieberman Hardcover $114.59

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Editorial Reviews

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"The text provides and excellent reference for plasma processing." - SAMPE Journal

Product Details

  • Hardcover: 546 pages
  • Publisher: William Andrew; 1 edition (January 14, 1991)
  • Language: English
  • ISBN-10: 0815512201
  • ISBN-13: 978-0815512202
  • Product Dimensions: 9.2 x 6.4 x 1.2 inches
  • Shipping Weight: 2 pounds (View shipping rates and policies)
  • Average Customer Review: 3.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #1,888,839 in Books (See Top 100 in Books)

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4 of 5 people found the following review helpful:
3.0 out of 5 stars Lacking detailed description of the plasma-kinetic model, May 23, 1999
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This review is from: Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions (Materials Science and Process Technology) (Hardcover)
Fair overview of basic plasma processing techniques. Because it's written by various experts in the field, the quality varies from chapter to chapter. The section on reactive ion etching comes highly recommended and is thoroughly referenced.
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
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Inside This Book (learn more)
First Sentence:
The driving force for the rapid development of plasma based processing over the past 15 years has been the microelectronics industry and in particular, the fabrication of silicon integrated circuits. Read the first page
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Thin Solid Films, New York, Solid State Technol, Academic Press, John Wiley, The Electrochem, Glow Discharge Processes, Extended Abstracts, Ionized Cluster Beam, Materials Research Society, Park Ridge, Physics of Thin Films, New Jersey, Plasma Sci, Electron Spect, Electronic Mat, Interaction of Electrons, Interface Anal, Los Angeles, Proceedings of the Sixth Symposium, Revue Le Vide, San Diego, Solid State Electronics, Symposia Proceedings Series, Vacuum Congress
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