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Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions (Materials Science and Process Technology) Hardcover – January 14, 1991

ISBN-13: 978-0815512202 ISBN-10: 0815512201 Edition: 1st

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Product Details

  • Series: Materials Science and Process Technology
  • Hardcover: 546 pages
  • Publisher: William Andrew; 1 edition (January 14, 1991)
  • Language: English
  • ISBN-10: 0815512201
  • ISBN-13: 978-0815512202
  • Product Dimensions: 6 x 1.2 x 9 inches
  • Shipping Weight: 2 pounds (View shipping rates and policies)
  • Average Customer Review: 3.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #1,682,420 in Books (See Top 100 in Books)

Editorial Reviews

Review

"The text provides and excellent reference for plasma processing." - SAMPE Journal

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4 of 5 people found the following review helpful By A Customer on May 23, 1999
Format: Hardcover
Fair overview of basic plasma processing techniques. Because it's written by various experts in the field, the quality varies from chapter to chapter. The section on reactive ion etching comes highly recommended and is thoroughly referenced.
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