Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
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Inside This Book
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Volume 1 describes the basic principles of low-temperature, Lorentzian, partially ionized plasmas used industrially. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
negative glow plasma, thermal diffusion treatment, sheath frequency, glow discharge plasma reactors, plasma ion implantation, etching reaction products, plasma active species, electron kinetic temperature, electron bombardment plasma source, plasma source subsystem, uniform glow discharge plasma, microelectronic deposition, power density coupled, xenon difluoride gas, industrial plasma processing, microelectronic etching technology, cathode fall voltage, energetic active species, gas utilization efficiencies, glow discharge plasma sources, microelectronic circuit fabrication, primary active species, gas supply subsystem, industrial plasma engineering, ion energy distribution function Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Ben Gadri, Plasma Sci, Boca Raton, Chemical Rubber Company, Thin Film Processes, United States, Institute of Physics Publishing, Silicon Valley, American Institute of Physics, Technical Note, Vol I-Principles, Volatile Primary Additive Probable, Bora Raton, Michael Faraday, National Academy Press, San Diego, Torr Figure, Van Brunt, Von Engle, Plasma Pot New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Volume 1 describes the basic principles of low-temperature, Lorentzian, partially ionized plasmas used industrially. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
negative glow plasma, thermal diffusion treatment, sheath frequency, glow discharge plasma reactors, plasma ion implantation, etching reaction products, plasma active species, electron kinetic temperature, electron bombardment plasma source, plasma source subsystem, uniform glow discharge plasma, microelectronic deposition, power density coupled, xenon difluoride gas, industrial plasma processing, microelectronic etching technology, cathode fall voltage, energetic active species, gas utilization efficiencies, glow discharge plasma sources, microelectronic circuit fabrication, primary active species, gas supply subsystem, industrial plasma engineering, ion energy distribution function Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Ben Gadri, Plasma Sci, Boca Raton, Chemical Rubber Company, Thin Film Processes, United States, Institute of Physics Publishing, Silicon Valley, American Institute of Physics, Technical Note, Vol I-Principles, Volatile Primary Additive Probable, Bora Raton, Michael Faraday, National Academy Press, San Diego, Torr Figure, Van Brunt, Von Engle, Plasma Pot New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 16
books:
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10
books
cite this book:
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- Thin Film Processes by John L. Vossen on 7 pages
- Thin-Film Deposition: Principles and Practice by Donald Smith on 4 pages
- Radio Frequency Capacitive Discharges by Yuri P. Raizer on page 283
- Silicon valley: A novel by Michael Rogers on page 5
- Science and Technology (Visual Factfinder) by Brian Williams on page 449
See all 16 books this book cites
- Industrial Plasma Engineering: Applications by J Reece Roth on 6 pages
- Pulsed and Pulsed Bias Sputtering: Principles and Applications by Edward V. Barnat in Back Matter (1), and Back Matter (2)
- Plasma Formulary for Physics, Technology and Astrophysics by Declan Diver in Back Matter
- The Fourth State of Matter by Shalom Eliezer in Back Matter
- Vacuum Ultraviolet Spectroscopy I, Volume 31 (Experimental Methods in the Physical Sciences) by Thomas Lucatorto on page 62
See all 10 books citing this book
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