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Industrial Plasma Engineering - 2 Volume Set: Industrial Plasma Engineering: Volume 1: Principles
 
 
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Industrial Plasma Engineering - 2 Volume Set: Industrial Plasma Engineering: Volume 1: Principles [Hardcover]

J Reece Roth (Author)


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Hardcover, January 1, 1995 --  
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Book Description

0750303174 978-0750303170 January 1, 1995 1
This book will provide the necessary theoretical background and a description of plasma-related devices and processes that are used industrially for physicists and engineers.
It is a self-contained introduction to the principles of plasma engineering with comprehensive references. This volume also includes the terminology, jargon and acronyms used in the field of industrial plasma engineering - indexed when they first appear in the text - along with their definitions and a discussion of their meaning. It is aimed at assisting the student in learning key terminology and concepts, and providing the in-service engineer or scientist with a technical glossary. An extensive index and appendices enhance the value of this book as a key reference source. These incorporate a list of the nomenclature used in mathematical expressions in the text, physical constants, and often-used plasma formulae. SI units are used throughout.
Intended for students from all engineering and physical science disciplines, and as a reference source by in-service engineers.
Coverage:
* basic information on plasma physics and the physical processes important in industrial plasmas
* sources of ion and electron beams and ionizing radiation used in industrial applications
* physics and technology of DC and RF electrical discharges.

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I enjoyed reading the book and recommend it highly to others as a clearly written, well-illustrated and very informative text, which brings up to date the material in several older classics
- Fusion Technology

Product Details

  • Hardcover: 339 pages
  • Publisher: Taylor & Francis; 1 edition (January 1, 1995)
  • Language: English
  • ISBN-10: 0750303174
  • ISBN-13: 978-0750303170
  • Product Dimensions: 9.5 x 6.4 x 1.4 inches
  • Shipping Weight: 2.5 pounds
  • Amazon Best Sellers Rank: #1,248,974 in Books (See Top 100 in Books)

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Inside This Book (learn more)
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First Sentence:
Volume 1 describes the basic principles of low-temperature, Lorentzian, partially ionized plasmas used industrially. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
sheath frequency, thermal diffusion treatment, inductive plasma source, plasma ion implantation, magnetron plasma sources, negative glow plasma, uniform glow discharge plasma, glow discharge plasma reactors, glow discharge plasma sources, plasma active species, electron kinetic temperature, electron bombardment plasma source, plasma source subsystem, etching reaction products, gas supply subsystem, microelectronic etching technology, plasma diagnostic instruments, industrial plasma processing, microelectronic deposition, retarding potential energy analyzer, ion kinetic temperature, power density coupled, xenon difluoride gas, ion energy distribution function, ion implantation facility
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Ben Gadri, Thin Film Processes, Boca Raton, Chemical Rubber Company, Plasma Sci, United States, Institute of Physics Publishing, Silicon Valley, Technical Note, Plasma Deposited Thin Films, Thesis University of Tennessee, Torr Figure, Volatile Primary Additive Probable, American Institute of Physics, Michael Faraday, National Academy Press, Radio-Frequency Capacitive Discharges, San Diego, University Paul Sabatier, Von Engle
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