Based on lecture notes that have been used by the authors for the past ten years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin-film physics and technology. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, three special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book should be relevant not just to those involved in materials science but also to engineers.
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