First Sentence:
Silicon MOS (metal-oxide-semiconductor) devices have become the mainstay of the semiconductor industry.
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Key Phrases - Statistically Improbable Phrases (SIPs):
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prompt interface traps, dose enhancement factor, radiation hardness testing, geminate model, hole transport data, interface trap buildup, positive threshold voltage shifts, polysilicon gate devices, degrade hardness, preirradiation value, total dose damage, more interface traps, total dose testing, local photocurrents, dispersive hole transport, hardened technology, ion shunt, other plasma processes, pair creation energy, trapped hole density, postirradiation effects, equilibrium dose, flatband voltage shift, upset thresholds, charge nonuniformities
Key Phrases - Capitalized Phrases (CAPs):
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Electron Devices, New York, After Winokur, Pergamon Press, Sandia National Laboratories, Monte Carlo, Solid-State Electron, Interface-State Generation, Solid State Circuits, Academic Press, After Sexton, Bell Syst, Generation of Interface States, The Electrochemical Society, Van Gunten, After Boesch, After Schwank, Gamma Rays, New Mexico, After Ning, After Refs, Heavy Charged Particles, Insulating Films, Solid State Technol, Summary References
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