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Ionizing Radiation Effects in MOS Devices and Circuits
 
 
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Ionizing Radiation Effects in MOS Devices and Circuits [Hardcover]

T. P. Ma (Editor), Paul V. Dressendorfer (Editor)
5.0 out of 5 stars  See all reviews (1 customer review)

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Book Description

047184893X 978-0471848936 April 1989 1
The first comprehensive overview describing the effects of ionizing radiation on MOS devices, as well as how to design, fabricate, and test integrated circuits intended for use in a radiation environment. Also addresses process-induced radiation effects in the fabrication of high-density circuits. Reviews the history of radiation-hard technology, providing background information for those new to the field. Includes a comprehensive review of the literature and an annotated listing of research activities in radiation-hardness research.

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The first comprehensive overview describing the effects of ionizing radiation on MOS devices, as well as how to design, fabricate, and test integrated circuits intended for use in a radiation environment. Also addresses process-induced radiation effects in the fabrication of high-density circuits. Reviews the history of radiation-hard technology, providing background information for those new to the field. Includes a comprehensive review of the literature and an annotated listing of research activities in radiation-hardness research.

Product Details

  • Hardcover: 608 pages
  • Publisher: Wiley-Interscience; 1 edition (April 1989)
  • Language: English
  • ISBN-10: 047184893X
  • ISBN-13: 978-0471848936
  • Product Dimensions: 9.6 x 6.6 x 1.4 inches
  • Shipping Weight: 2.1 pounds (View shipping rates and policies)
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #2,473,357 in Books (See Top 100 in Books)

 

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1 of 1 people found the following review helpful:
5.0 out of 5 stars Excellent Reference!, December 4, 2001
By A Customer
This review is from: Ionizing Radiation Effects in MOS Devices and Circuits (Hardcover)
Great book. (...) If you are starting out in the Rad Effects community this is the book for you. Lots of material and little fluff.
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Inside This Book (learn more)
First Sentence:
Silicon MOS (metal-oxide-semiconductor) devices have become the mainstay of the semiconductor industry. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
prompt interface traps, dose enhancement factor, radiation hardness testing, geminate model, hole transport data, interface trap buildup, positive threshold voltage shifts, polysilicon gate devices, degrade hardness, preirradiation value, total dose damage, more interface traps, total dose testing, local photocurrents, dispersive hole transport, hardened technology, ion shunt, other plasma processes, pair creation energy, trapped hole density, postirradiation effects, equilibrium dose, flatband voltage shift, upset thresholds, charge nonuniformities
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Electron Devices, New York, After Winokur, Pergamon Press, Sandia National Laboratories, Monte Carlo, Solid-State Electron, Interface-State Generation, Solid State Circuits, Academic Press, After Sexton, Bell Syst, Generation of Interface States, The Electrochemical Society, Van Gunten, After Boesch, After Schwank, Gamma Rays, New Mexico, After Ning, After Refs, Heavy Charged Particles, Insulating Films, Solid State Technol, Summary References
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