Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Lecture Notes on Principles of Plasma Processing
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3 of 3 people found the following review helpful:
3.0 out of 5 stars
Good for quick reading, Need Lieberman's book,
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This review is from: Lecture Notes on Principles of Plasma Processing (Paperback)
I found this to be a good book for quick reading. However, you need Lieberman and Lichtenberg (L &L) for a detailed treatment. L & L is of course not a very pleasant reading, so this provides a good break to "keep moving" through the material.
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Inside This Book
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First Sentence:
Plasma is matter heated beyond its gaseous state, heated to a temperature so high that atoms are stripped of at least one electron in their outer shells, so that what remains are positive ions in a sea of free electrons. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
ion directionality, etching yield, helicon discharges, spontaneous etching, sheath drop, profile simulator, ion bombardment energy, etching products, plasma tools, high aspect ratio features, sheath edge, plasma etching processes, helicon waves, optical emission spectrum, electron impact dissociation, etching rate, sheath field, reactive neutrals, oxide damage, high etch rate, enhanced etching, plasma potential, electron impact excitation, sputtering yield, plasma processing Key Phrases - Capitalized Phrases (CAPs): (learn more)
Course Notes, Monte Carlo, Center of Antenna, Applied Materials, Faraday's Law, Processing Bonding New!
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Front Cover | Table of Contents | First Pages | Back Cover | Surprise Me!
Plasma is matter heated beyond its gaseous state, heated to a temperature so high that atoms are stripped of at least one electron in their outer shells, so that what remains are positive ions in a sea of free electrons. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
ion directionality, etching yield, helicon discharges, spontaneous etching, sheath drop, profile simulator, ion bombardment energy, etching products, plasma tools, high aspect ratio features, sheath edge, plasma etching processes, helicon waves, optical emission spectrum, electron impact dissociation, etching rate, sheath field, reactive neutrals, oxide damage, high etch rate, enhanced etching, plasma potential, electron impact excitation, sputtering yield, plasma processing Key Phrases - Capitalized Phrases (CAPs): (learn more)
Course Notes, Monte Carlo, Center of Antenna, Applied Materials, Faraday's Law, Processing Bonding New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Back Cover | Surprise Me!
Citations (learn more)
This book cites 3
books:
- Principles of Plasma Discharges and Materials Processing , 2nd Edition by Michael A. Lieberman in Front Matter
- Introduction to plasma physics and controlled fusion. Volume 1, Plasma physics by Francis F. Chen in Front Matter
- Introduction to Plasma Physics by Francis F. Chen in Front Matter
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