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Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28)
 
 
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Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28) [Paperback]

Harry J. Levinson (Author)
4.5 out of 5 stars  See all reviews (2 customer reviews)

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Book Description

February 12, 1999 0819430528 978-0819430526
Covers lithography process control at several levels, from fundamental through advanced topics. Self-contained tutorial works both as an introduction to the technology and as a reference for the experienced lithographer. Reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback.

Contents

- Preface
- Introduction to the use of statistical process control in lithography
- Sampling
- Simple and complex processes
- Linewidth control
- Overlay
- Yield
- Process drift and automatic process control
- Metrology
- Control of operations


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Customers buy this book with Fundamental Principles of Optical Lithography: The Science of Microfabrication $63.00

Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28) + Fundamental Principles of Optical Lithography: The Science of Microfabrication
Price For Both: $111.00

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Product Details

  • Paperback: 190 pages
  • Publisher: SPIE Publications (February 12, 1999)
  • Language: English
  • ISBN-10: 0819430528
  • ISBN-13: 978-0819430526
  • Product Dimensions: 10 x 7 x 0.6 inches
  • Shipping Weight: 15.8 ounces (View shipping rates and policies)
  • Average Customer Review: 4.5 out of 5 stars  See all reviews (2 customer reviews)
  • Amazon Best Sellers Rank: #2,228,063 in Books (See Top 100 in Books)

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6 of 7 people found the following review helpful:
4.0 out of 5 stars Great textbook for SPC & DOE's, April 5, 2000
By A Customer
This review is from: Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28) (Paperback)
This is one of the best texts I've seen in terms of understanding SPC's and DOE's for microlithography. This text is very very helpful for setting up SPC's for lithographic processes. It also helps greatly in setting up DOE frameworks for lithographic process development.I would definitely recommend this for anyone in the lithographic field.
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5.0 out of 5 stars Outstanding, July 26, 2007
This review is from: Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28) (Paperback)
Indispensable reference for process engineers. Very good coverage of the basics. I would also suggest you these references:

i. Microlithography: Science and Technology by Bruce W. Smith

ii. Principles of Lithography by Harry J. Levinson

They are complementary. Enjoy!
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Inside This Book (learn more)
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
overlay measurement structures, average resist thickness, linewidth measurement systems, intrafield errors, overlay errors, measuring overlay, reticle rotation, linewidth control, lithography operation, single stepper, fifth order distortion, overlay measurements, unpatterned wafers, wafer steppers, test wafers, product wafers, funnel experiment, defect monitors, individual wafers, process capability indices, resist processing, linewidth variation, magnification error, average run length, alignment targets
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Journal of Quality Technology, New York, Microelectronics Seminar, Western Electric Rules, Proceedings of the Olin Microlithography Seminar, John Wiley, Semiconductor International, Quality Progress, Automatic Process Control
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
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