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2 of 4 people found the following review helpful:
4.0 out of 5 stars Design for Yield, December 16, 2007
This review is from: Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems) (Hardcover)
Design for Manufacturability and Yield for Nano-Scale CMOS (Series on Integrated Circuits and Systems)

This book provides a good overview of the challenges in IC design for manufacturing and yield optimization.
It covers all the advanced problems at 65nm and below such as random and systematic variability, CMP and statistical design analysis.
The book represents an useful introduction to those topics for students, engineers and technical managers in the microelectronics industry.
The drawbacks are:
- very poor graphical quality of pictures and diagrams
- lack of an index
- some missing of relevant industrial examples (devices, metrics, analysis results)
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Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems)
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