Micro- and Nanopatterning Polymers (ACS Symposium) [Hardcover]

Hiroshi Ito (Editor), Elsa Reichmanis (Editor), Omkaram Nalamasu (Editor), Takumi Ueno (Editor)

Book Description

ISBN-10: 0841235813 | ISBN-13: 978-0841235816 | Publication Date: October 1, 1998

Use of polymers is widespread in the electronics industry, both in manufacturing integrated circuits and as components in the completed devices. In addition to providing an update in conventional microlithography technology, Micro- and Nanopatterning Polymers describes new patterning techniques involving block copolymers, direct deposition of metal oxides and other materials, and image-wise chemical deposition. It illustrates the challenges and opportunities in designing ArF excimer laser resists in the next generation of lithographic technology. The book includes discussions of material design alternatives, acid generator chemistries, and acid diffusion mechanisms in chemically amplified resists, which have now replaced novolac/diazoquinone resists in device manufacturing. Providing insight into the most recent breakthroughs in nano-technology, this unique book is an important step in the development of integrated circuits.

Editorial Reviews

Review

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About the Author

Hiroshi Ito, IBM Almaden Research Center. Omkaram Nalamasu, both at Bell Laboratories, Lucent Technologies.

Product Details

• Hardcover: 400 pages
• Publisher: American Chemical Society (October 1, 1998)
• Language: English
• ISBN-10: 0841235813
• ISBN-13: 978-0841235816
• Product Dimensions: 8.9 x 6.3 x 0.7 inches
• Shipping Weight: 1.6 pounds
• Amazon Best Sellers Rank: #4,598,199 in Books (See Top 100 in Books)