"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Microlithography Fundamentals in Semiconductor Devices an...
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Inside This Book
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First Sentence:
Before the transistor action was first confirmed by W. Shockley, J. Bardeen and W. H. Brattain at Bell Laboratories in 1948, photolithography had been well developed and widely used to fabricate printing plates. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
threshold exposure dose, iodinated polystyrene, line mask pattern, chemical amplification resists, calculated light intensity distribution, resist composed, precise pattern transfer, solid film thickness, excimer laser lithography, novolak resin, black line image, distance between the mask, resist film, chemically amplified resists, planarizing layer, acid generators, dissolution inhibition, dissolution inhibitor, lithographic performance, photoacid generator, bilayer resist, inorganic resists, electron beam resist, flood exposure, deprotection reaction Key Phrases - Capitalized Phrases (CAPs): (learn more)
Solid State Technol, Electron Devices, Photopolymer Sci, Microelectronic Eng, New York, American Chemical Society, Electron Device Lett, The Institute of Electronics, Kodak Thin Film Resist, Polymer Eng, Professional Reference Book New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Before the transistor action was first confirmed by W. Shockley, J. Bardeen and W. H. Brattain at Bell Laboratories in 1948, photolithography had been well developed and widely used to fabricate printing plates. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
threshold exposure dose, iodinated polystyrene, line mask pattern, chemical amplification resists, calculated light intensity distribution, resist composed, precise pattern transfer, solid film thickness, excimer laser lithography, novolak resin, black line image, distance between the mask, resist film, chemically amplified resists, planarizing layer, acid generators, dissolution inhibition, dissolution inhibitor, lithographic performance, photoacid generator, bilayer resist, inorganic resists, electron beam resist, flood exposure, deprotection reaction Key Phrases - Capitalized Phrases (CAPs): (learn more)
Solid State Technol, Electron Devices, Photopolymer Sci, Microelectronic Eng, New York, American Chemical Society, Electron Device Lett, The Institute of Electronics, Kodak Thin Film Resist, Polymer Eng, Professional Reference Book New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 4
books:
2
books
cite this book:
- Organic Synthesis by Michael B Smith on page 128
- Modern Molecular Photochemistry by Nicholas J. Turro on page 124
- Principles of Optics: Electromagnetic Theory of Propagation, Interference and Diffraction of Light by Max Born in Back Matter
- Introduction to Microlithography (Acs Professional Reference Book) by Larry F. Thompson on page 225
- Direct-Write Technologies for Rapid Prototyping: Applications to Sensors, Electronics, and Passivation Coatings by Alberto Pique in Back Matter
- The Science and Engineering of Microelectronic Fabrication by Stephen A. Campbell on page 202
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