This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
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Most Helpful Customer Reviews
6 of 6 people found the following review helpful:
5.0 out of 5 stars
Very up to date information from leaders in the field.,
By A Customer
This review is from: Microlithography Science and Technology (Hardcover)
I teach a graduate class in Microlithography and this is the best text I have seen to date. It contains all the modern techniques presented in an easy to read format. I highly recommend this text for all process engineers in the field or engineers wishing to learn more about this integrated circuit processing technique.
5 of 5 people found the following review helpful:
5.0 out of 5 stars
Excellent reference text for the lithographer!,
By A Customer
This review is from: Microlithography Science and Technology (Hardcover)
Microlithography: Science and Technology has been a valuable reference text. I would recommend this book be on the desk of anyone in the field of microlithography.
2 of 2 people found the following review helpful:
5.0 out of 5 stars
E-beam Lithography,
By A Customer
This review is from: Microlithography Science and Technology (Hardcover)
The book provides a great overview of the Electron Beam Lithography, which was the material of interest for me. Material is conveyed in great detail while the meaning of the material is not necessarily constricted to the experts. As an undergraduate student, I found the material readable. I was also able to understand most of the information well and as a result I believe I have a good base of knowledge about lithography. I would definitely recommend this book to other students.
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Inside This Book
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First Sentence:
Microlithography is a manufacturing process for producing highly accurate, microscopic, two-dimensional patterns in a photosensitive resist material. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
lithographic lens, lithographic exposure system, lithography instrument, development rate curves, resist composed, bump centroid, dissolution inhibition capability, multilayer resist processes, dissolution inhibition effect, presilylation bake, proximal probe lithography, glow phase, alignment mark detector, chromium background, lithography modeling, pulsed power module, resist dissolution rate, wafer alignment mark, prebake time, dipole illumination, line edge position, quadrupole illumination, correlator algorithm, lithography simulation, postexposure bake Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Monte Carlo, Solid State Technol, Smith Figure, International Conference, Ueno Figure, Hibbs Figure, American Chemical Society, Academic Press, Ueno Scheme, Bell Laboratories, Gallatin Figure, Principles of Optics, Vac Sci, Laser Microlithography, Marchman Figure, Quantum Electron, San Jose, Axial Distance, Delft University Press, Dissolution Temperature, Igor Fomenkov, Kodak Interface, Microlithography World, Pergamon Press New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Microlithography is a manufacturing process for producing highly accurate, microscopic, two-dimensional patterns in a photosensitive resist material. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
lithographic lens, lithographic exposure system, lithography instrument, development rate curves, resist composed, bump centroid, dissolution inhibition capability, multilayer resist processes, dissolution inhibition effect, presilylation bake, proximal probe lithography, glow phase, alignment mark detector, chromium background, lithography modeling, pulsed power module, resist dissolution rate, wafer alignment mark, prebake time, dipole illumination, line edge position, quadrupole illumination, correlator algorithm, lithography simulation, postexposure bake Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Monte Carlo, Solid State Technol, Smith Figure, International Conference, Ueno Figure, Hibbs Figure, American Chemical Society, Academic Press, Ueno Scheme, Bell Laboratories, Gallatin Figure, Principles of Optics, Vac Sci, Laser Microlithography, Marchman Figure, Quantum Electron, San Jose, Axial Distance, Delft University Press, Dissolution Temperature, Igor Fomenkov, Kodak Interface, Microlithography World, Pergamon Press New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 30
books:
See all 30 books this book cites
- Principles of Optics: Electromagnetic Theory of Propagation, Interference and Diffraction of Light by Max Born on 5 pages
- Introduction to Microlithography (Acs Professional Reference Book) by Larry F. Thompson on page 563, page 610, and page 766
- Technology of Proximal Probe Lithography (Spie Institutes for Advanced Optical Technologies, Vol Is 10) by Christie R. K. Marrian on page 769, and page 771
- Introduction to Fourier Optics by Joseph Goodman on page 165, and page 268
- Fundamentals of Analytical Chemistry (with CD-ROM and InfoTrac) by Douglas A. Skoog on page 166
See all 30 books this book cites
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