This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).
FREE Two-Day Shipping for students on millions of items. Learn more |
| |||||||||||||||
Book Description
Editorial Reviews
Review
'This book has many admirable properties. It covers the chosen subject in considerable detail and brings together much of the state-of-the-art. The illustrations and photographs are of very high quality and indeed the whole book is well presented. It will be useful to both the experienced engineer wishing to sort out a few problems in his own work and to those requiring an introduction to silicon microengineering' R. A. Lawes, Engineering Science and Education Journal
Book Description
This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. It is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).
Product Details
Would you like to update product info or give feedback on images?
|
More About the Authors
Discover books, learn about writers, read author blogs, and more.
Customer Reviews
|
There are no customer reviews yet.
|
|||
|
Video reviews
|
Inside This Book
(learn more)
Browse and search another edition of this book.
Browse and search another edition of this book.
First Sentence:
Etching and bonding of silicon are basic technologies in micro systems technology (MST). Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
microelectromechanical systems, film deposition, thin film processes, assisted radical etching, ratio trench etching, wagon wheel method, time etch stop, plasma glow region, ion shadowing, target platen, image force theory, remote plasma etching, image force mechanism, etch rate minimum, etch directionality, underetch rate, sacrificial layer etching, anisotropic wet chemical etching, etch stop mechanisms, etch apparatus, anisotropic etching solutions, hydrophobic wafers, bottling effect, ion deflection, radical depletion Key Phrases - Capitalized Phrases (CAPs): (learn more)
Crystal Growth, San Diego, The Netherlands, San Francisco, Micro Electro Mechanical Systems, Electrochem Soc, University of Twente, First Law, Academic Press, New York, Hilton Head Island, Third Law, Second Law, Physical Chemistry, Plasma Techniques, Salt Lake City, Napa Valley, Uppsala University, John Wiley, Electron Devices, Thin Solid Films, Park Ridge, Monte Carlo, New Jersey, North Holland Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Etching and bonding of silicon are basic technologies in micro systems technology (MST). Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
microelectromechanical systems, film deposition, thin film processes, assisted radical etching, ratio trench etching, wagon wheel method, time etch stop, plasma glow region, ion shadowing, target platen, image force theory, remote plasma etching, image force mechanism, etch rate minimum, etch directionality, underetch rate, sacrificial layer etching, anisotropic wet chemical etching, etch stop mechanisms, etch apparatus, anisotropic etching solutions, hydrophobic wafers, bottling effect, ion deflection, radical depletion Key Phrases - Capitalized Phrases (CAPs): (learn more)
Crystal Growth, San Diego, The Netherlands, San Francisco, Micro Electro Mechanical Systems, Electrochem Soc, University of Twente, First Law, Academic Press, New York, Hilton Head Island, Third Law, Second Law, Physical Chemistry, Plasma Techniques, Salt Lake City, Napa Valley, Uppsala University, John Wiley, Electron Devices, Thin Solid Films, Park Ridge, Monte Carlo, New Jersey, North Holland Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
14
books
cite this book:
See all 14 books citing this book
- Mechanical Microsensors (Microtechnology and MEMS) by M. Elwenspoek on 15 pages
- Shape and Functional Elements of the Bulk Silicon Microtechnique: A Manual of Wet-Etched Silicon Structures by Joachim Frühauf on page 3, page 15, and page 65
- Handbook of Machine Olfaction: Electronic Nose Technology by Tim C. Pearce on page 223
- MEMS Mechanical Sensors by Steve P. Beeby on page 169
- Nanoscale Technology in Biological Systems by Ralph S. Greco on page 98
See all 14 books citing this book
Tag this product(What's this?)Think of a tag as a keyword or label you consider is strongly related to this product.
Tags will help all customers organize and find favorite items. |
Sell a Digital Version of This Book in the Kindle Store
If you are a publisher or author and hold the digital rights to a book, you can sell a digital version of it in our Kindle Store.
Learn more
Customer Discussions
|
This product's forum
Active discussions in related forums
Search Customer Discussions
|
Related forums
|
