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Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching: Application to Rough and Natural Surfaces (NanoScience and Technology)
 
 
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Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching: Application to Rough and Natural Surfaces (NanoScience and Technology) [Hardcover]

Gerd Kaupp (Author)
2.0 out of 5 stars  See all reviews (1 customer review)

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Book Description

3540284052 978-3540284055 September 15, 2006 1
Making a clear distinction is made between nano- and micro-mechanical testing for physical reasons, this monograph describes the basics and applications of the supermicroscopies AFM and SNOM, and of the nanomechanical testing on rough and technical natural surfaces in the submicron range down to a lateral resolution of a few nm. New or improved instrumentation, new physical laws and unforeseen new applications in all branches of natural sciences (around physics, chemistry, mineralogy, materials science, biology and medicine) and nanotechnology are covered as well as the sources for pitfalls and errors. It outlines the handling of natural and technical samples in relation to those of flat standard samples and emphasizes new special features. Pitfalls and sources of errors are clearly demonstrated as well as their efficient remedy when going from molecularly flat to rough surfaces. The academic or industrial scientist learns how to apply the principles for tackling their scientific or manufacturing tasks that include roughness far away from standard samples.

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From the Back Cover

Making a clear distinction is made between nano- and micro-mechanical testing for physical reasons, this monograph describes the basics and applications of the supermicroscopies AFM and SNOM, and of the nanomechanical testing on rough and technical natural surfaces in the submicron range down to a lateral resolution of a few nm. New or improved instrumentation, new physical laws and unforeseen new applications in all branches of natural sciences (around physics, chemistry, mineralogy, materials science, biology and medicine) and nanotechnology are covered as well as the sources for pitfalls and errors. It outlines the handling of natural and technical samples in relation to those of flat standard samples and emphasizes new special features. Pitfalls and sources of errors are clearly demonstrated as well as their efficient remedy when going from molecularly flat to rough surfaces. The academic or industrial scientist learns how to apply the principles for tackling their scientific or manufacturing tasks that include roughness far away from standard samples.

Product Details

  • Hardcover: 304 pages
  • Publisher: Springer; 1 edition (September 15, 2006)
  • Language: English
  • ISBN-10: 3540284052
  • ISBN-13: 978-3540284055
  • Product Dimensions: 9.3 x 6.2 x 0.6 inches
  • Shipping Weight: 1.2 pounds (View shipping rates and policies)
  • Average Customer Review: 2.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #3,413,887 in Books (See Top 100 in Books)

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0 of 1 people found the following review helpful:
2.0 out of 5 stars Not very rigorous, December 22, 2008
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J. R. Torres (RI United States) - See all my reviews
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This review is from: Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching: Application to Rough and Natural Surfaces (NanoScience and Technology) (Hardcover)
This book is not very rigorous. It does not cover the details on the techniques. Very few diagrams. A lot of data with little scaling, theoretical treatment or simple mathematics to describe results. What am I supposed to do?... Memorize the results for each experiment?... It is representative with the poor state of research science. Lots of money, lots of people spending it buying equipment, and everybody doing what everybody else is doing, except using a different material. Poor... poor... poor...
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Inside This Book (learn more)
First Sentence:
Atomic force microscopy (AFM) is also known as scanning force microscopy (SFM). Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
anisotropic molecular migrations, apertured tip, normal displ, scratch coefficients, cleavage plane direction, reflectance enhancement, steepness contrast, effective cone angle, topologic features, high topology, cube corner indenter, uncoated tip, indentation parameters, tip imaging, chemical contrast, scratch direction, tip breakage, indenter tip, scratch length, optical contrast, stripes contrast, local fluorescence, microtome cut, sample convolution, exponential plot
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, International Conference, Thin Solid Films, New Universal Exponent, Applied Scanning Probe Methods, Dependence of the Reflectance Enhancement, Foundations of the Nanoindentation Technique, Further Fields of Practical Application, Quantitative Treatment of Nanoscratching
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