Buy Used
Used - Good See details
$7.99 & eligible for FREE Super Saver Shipping on orders over $25. Details
Fulfilled by Amazon

or
Sign in to turn on 1-Click ordering.
 
   
Have one to sell? Sell yours here
Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
  
I own the rights to this title and would like to make it available again through Amazon.
Tell the Publisher!
I'd like to read this book on Kindle

Don't have a Kindle? Get your Kindle here, or download a FREE Kindle Reading App.

Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) [Hardcover]

Chris R. Kleijn (Author), Christoph Werner (Author)
5.0 out of 5 stars  See all reviews (1 customer review) |

Available from these sellers.


Textbook Student FREE Two-Day Shipping for students on millions of items. Learn more

Formats

 Amazon Price New from Used from
Hardcover $99.00   -- --
Hardcover, March 25, 1993 --   -- --

Product Details

  • Hardcover: 126 pages
  • Publisher: Birkhauser (March 25, 1993)
  • Language: English
  • ISBN-10: 0817628584
  • ISBN-13: 978-0817628581
  • Product Dimensions: 9 x 6 x 1 inches
  • Shipping Weight: 1.4 pounds
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #6,846,941 in Books (See Top 100 in Books)

    •  Would you like to update product info or give feedback on images?

More About the Author

› Visit Amazon's Chris R. Kleijn Page
Chris R. Kleijn
Discover books, learn about writers, read author blogs, and more.
 

Customer Reviews

1 Review
5 star:
 (1)
4 star:    (0)
3 star:    (0)
2 star:    (0)
1 star:    (0)
 
 
 
 
 
Average Customer Review
5.0 out of 5 stars (1 customer review)
 
 
 
 
Share your thoughts with other customers:
Most Helpful Customer Reviews

5.0 out of 5 stars Good book for beginners, February 20, 2001
By 
Wentao Ju (Athens, OH USA) - See all my reviews
This review is from: Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) (Hardcover)
Basically, it is a book about literature review but with well organized ideas proposed by the author himself. The author covered almost everything in the area of numerical simulation of CVD and focused on the transport phenomena simulation. The boundary conditions are described in detail. However, for the radiating heat transfer the description is not very useful for a beginner. There are only very general descriptions on this topic which interests me most. Some equations are somewhat confusing to the reader in the conjugate heat transfer part.
Help other customers find the most helpful reviews 
Was this review helpful to you? Yes No

Share your thoughts with other customers: Create your own review
 
 
 
Only search this product's reviews


Tag this product

 (What's this?)
Think of a tag as a keyword or label you consider is strongly related to this product.
Tags will help all customers organize and find favorite items.
Your tags: Add your first tag
 
See most popular tags

Sell a Digital Version of This Book in the Kindle Store

If you are a publisher or author and hold the digital rights to a book, you can sell a digital version of it in our Kindle Store. Learn more

Customer Discussions

This product's forum
Discussion Replies Latest Post
No discussions yet

Ask questions, Share opinions, Gain insight
Start a new discussion
Topic:
First post:
Prompts for sign-in
 


Active discussions in related forums
Search Customer Discussions
Search all Amazon discussions
   
Related forums

Listmania!


Create a Listmania! list

So You'd Like to...


Create a guide

Look for Similar Items by Category

Look for Similar Items by Subject

Search Books by subject:










i.e., each book must be in subject 1 AND subject 2 AND ...