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5.0 out of 5 stars
Good book for beginners,
By Wentao Ju (Athens, OH USA) - See all my reviews
This review is from: Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) (Hardcover)
Basically, it is a book about literature review but with well organized ideas proposed by the author himself. The author covered almost everything in the area of numerical simulation of CVD and focused on the transport phenomena simulation. The boundary conditions are described in detail. However, for the radiating heat transfer the description is not very useful for a beginner. There are only very general descriptions on this topic which interests me most. Some equations are somewhat confusing to the reader in the conjugate heat transfer part.
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Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) by Chris R. Kleijn (Hardcover - March 25, 1993)
Used & New from: $3.46
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