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Modelling of Microfabrication Systems
 
 
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Modelling of Microfabrication Systems [Hardcover]

R. Nassar (Author), W. Dai (Author)

Price: $129.00 & this item ships for FREE with Super Saver Shipping. Details
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Book Description

August 5, 2003 3540002529 978-3540002529 1
This is the first book to address modelling of systems that are important to the fabrication of three-dimensional microstructures. It is unique in that it focuses on high aspect ratio microtechnology, ranging from ion beam micromachining to x-ray lithography.

Editorial Reviews

Review

From the reviews: "This book is aimed at people working on simulation and optimization process fabrication of Microelectromechanical Systems (MEMS). … the book provides a fairly complete view of the modeling of microfabrication processes. … ‘It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications’." (Grégory Guisbiers, Physicalia, Vol. 26 (1), 2004)

From the Back Cover

This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications.

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Inside This Book (learn more)
First Sentence:
Ion beam technology is of vital importance in the area of microfabrication. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
percent monomer conversion, acoustic agitation, photophysical ablation, etch depth per pulse, heat diffusion model, ablated depth, ablation velocity, laser chemical vapor deposition, mask membrane, photophysical model, absorber edge, dissolution distance, slowness curve, high aspect ratio microstructures, soft focusing, proximity gap, monomer layer, polymer ablation, bottom dose, ablation depth, solidified polymer, ion beam technology, maximum temperature rise, thick gold film, sputter yield
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Elsevier Science, American Institute of Physics, American Vacuum Society, Francis Inc, Publishing Limited, American Chemical Society, Allerton Press Inc, Francis Ltd, New York, American Physical Society, Monte Carlo, Conversion Fig, Marcel Dekker Inc, Navier Stokes, University Press
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