Remote Sensing by Fourier Transform Spectrometry Reinhard Beer Here is a complete introduction to the specification, design, and implementation of Fourier Transform Spectrometers especially intended for atmospheric or astronomical remote sensing. Dr. Beer, one of the pioneers in this field, provides both specific and general information on the development of requirements for remote sensing Fourier transform infrared spectrometers and discusses many of the problems and pitfalls (along with their avoidance and solutions) that can beset the new user. 1992 (0 471-55346-8) 176 pp. Principles and Practice of Spectroscopic Calibration Howard Mark Clearly linking theory with applications, this unique guide to spectroscopic calibration advances an approach that is understandable, free of the usual uncertainties, and simple to execute. The book details the practical aspects of generating a calibration equation, as well as the basics of recognizing and dealing with different types of problems affecting calibration. Most of the procedures are applicable to such sophisticated and popular approaches as Principal Component Calibration, Partial Least Squares Calibration, and Fourier Transform Calibration. 1991 (0 471-54614-3) 192 pp. Activation Spectrometry in Chemical Analysis Susan J. Parry Knowing the specifics of activation analysis has become essential for a wide range of specialists, including chemists, physicists, and biologists, who need to know how to make the most effective use of this technique. In clear, easy-to-read language, this book provides a straightforward review of just what activation analysis can do, describing the technique as it is currently applied to analytical problems. With emphasis on activation spectrometry, Dr. Parry outlines the specifics of the procedure, which, along with other activation analysis methods, have proven critical to the technique's success. 1991 (0 471-63844-7) 264 pp.
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Editorial Reviews
From the Publisher
Offers an extremely useful overview of photochemical vapor desposition--its characteristics and potential--focusing on the properties of films that have been created by this versatile modern technique plus a thorough description of the conditions under which they were grown. Uses the approach that while photochemical vapor deposition (photo-CVD) is not the solution to all low temperature deposition methodologies, it does provide an added dimension of flexibility to and control over the growth process and has been proven to be valuable for those materials and growth steps in device fabrication that are sensitive to the processing temperature. Whenever applicable, the properties of electronic devices incorporating photo-CVD films are presented and numerous tables detail the deposition parameters as well as electrical and structural properties of the films of specific materials.
From the Inside Flap
Chemical vapor deposition (CVD) has proven to be enormously successful as a means of producing thin films for a wide array of advanced materials applications. Abrasion-resistant coatings, epitaxial layers for semiconductor lasers and MOS transistors, and low scatter films for optical components such as mirrors and beamsplitters, all rely on the ability of CVD to deposit films of controllable composition and uniform thickness. Photochemical vapor deposition (photo-CVD) is a recent offshoot of CVD that influences the rate and products of the deposition process with light. Introducing visible, ultraviolet, or vacuum ultraviolet photons to the CVD reactor opens new possibilities for reducing film growth temperatures and for producing novel materials. The purpose of this book is to provide an overview of photochemical vapor deposition, with emphasis on the versatility of this new technique for growing metal, dielectric and semiconductor films. Applications receiving special attention include the photodeposition of dielectric films for the fabrication of VLSI devices and the growth of amorphous hydrogenated silicon for photovoltaic applications. Introductory material describing the basic principles underlying photo-CVD is the subject of the first two chapters. Chapter 3 addresses several practical aspects of designing photo-CVD systems and choosing an optical source, in particular, Following chapters discuss the current status of metal, semiconductor, and dielectric films that have been grown by photo-CVD; and the growth of other materials such as polymers and metal oxides composing the Bi-Sr-Ca-Cu-O high Tc superconductor system. Also included are a discussion of the application of photo-CVD to the fabrication of multilayer, short wavelength mirrors, and a review of light-enhanced surface processing such as cleaning and nitridation. The book concludes with an assessment of the future of photodeposition. Designed to be highly readable and easily adapted to the needs of a diverse audience, Photochemical Vapor Deposition will be especially valuable for the student approaching photodeposition for the first time, the thin film engineer evaluating photo-CVD for a particular application, and the experienced researcher who desires a review of the work completed to date. In addition, materials scientists and engineers or physical and analytical chemists who are applying photo-CVD to the synthesis of advanced materials will find this book to be an indispensable addition to their working libraries.
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