Photoinitiated Polymerization is divided into five sections. Free radical photopolymerizations command most of the interest and activity within the field and thus is discussed first. The second section discusses kinetic studies of the mechanism of free radical polymerizations. The third section covers cationic photopolymerizations, which along with free radical polymerizations, are being used in many industrial applications. The fourth section is devoted to recent developments in novel photopolymeriztion chemistry. This section describes new photobase generators, developments in monomers, oligomers and templated polymerizations of liquid crystal polymers. Finally, the fifth section portrays new and emerging applications for photopolymerizations.
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Free radical photopolymerizations still command most of the interest and activity within the field and these photopolymerizations are the subject of the first section. The DKI Literature Database on Polymers
About the Author
Kevin D. Belfield is at University of Central Florida. James V. Crivello is at Rensselaer Polytechnic Institute.
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Cyclic N-vinylamides were found to increase the maximum relative rates of photopolymerization of hexanedioldiacrylate formulations at low light intensities under nitrogen and dramatically under air, while acyclic N-vinylamides and cyclic N-alkylamides were found to have much smaller, though still significant, effects in air. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
autohesion strength, grafted plates, acrylic hydroxyl content, dialkylphenacylsulfonium salts, grafted amount, onium salt photoinitiators, deep curing, microelectronic encapsulants, urethane viscosity, photoinitiated cationic polymerization, spiro ortho ester groups, trimethylolpropane tris, postcure time, aminoalkyl radicals, cationic photopolymerization, photopolymerization kinetics, maximum relative rates, pentaerythritol triallyl ether, photopolymerization rate, pulsed laser polymerization, rubbed polyimide films, epoxide polymerization, added photoinitiator, thermal stress parameter, carbazole compounds Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, American Chemical Society, Experimental Materials, John Wiley, National Science Foundation, University of Southern Mississippi, Ciba Specialty Chemicals, Nguyen Thi Viet, Polymer Sci, Rensselaer Polytechnic Institute, Clopper Road, Elsevier Applied Science, Perkin Elmer, Perstorp Specialty Chemicals, Plenum Press, Technology Ltd, Aldrich Chemical Company, Columbia University, Introduction Photoinitiated, Sartomer Company, Seiko Instruments Inc, Academic Press, Applied Photophysics, Charles Street, Chemicals Corporation New!
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Cyclic N-vinylamides were found to increase the maximum relative rates of photopolymerization of hexanedioldiacrylate formulations at low light intensities under nitrogen and dramatically under air, while acyclic N-vinylamides and cyclic N-alkylamides were found to have much smaller, though still significant, effects in air. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
autohesion strength, grafted plates, acrylic hydroxyl content, dialkylphenacylsulfonium salts, grafted amount, onium salt photoinitiators, deep curing, microelectronic encapsulants, urethane viscosity, photoinitiated cationic polymerization, spiro ortho ester groups, trimethylolpropane tris, postcure time, aminoalkyl radicals, cationic photopolymerization, photopolymerization kinetics, maximum relative rates, pentaerythritol triallyl ether, photopolymerization rate, pulsed laser polymerization, rubbed polyimide films, epoxide polymerization, added photoinitiator, thermal stress parameter, carbazole compounds Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, American Chemical Society, Experimental Materials, John Wiley, National Science Foundation, University of Southern Mississippi, Ciba Specialty Chemicals, Nguyen Thi Viet, Polymer Sci, Rensselaer Polytechnic Institute, Clopper Road, Elsevier Applied Science, Perkin Elmer, Perstorp Specialty Chemicals, Plenum Press, Technology Ltd, Aldrich Chemical Company, Columbia University, Introduction Photoinitiated, Sartomer Company, Seiko Instruments Inc, Academic Press, Applied Photophysics, Charles Street, Chemicals Corporation New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 34
books:
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2
books
cite this book:
- Radiation Curing in Polymer Science and Technology, Volume 3: Polymerisation Mechanisms by Jean-Pierre Fouassier on 10 pages
- Radiation Curing (Rapra Review Reports) by R.S. Davidson on 6 pages
- Controlled Radical Polymerization (ACS Symposium) by Krzysztof Matyjaszewski on page 112, and page 125
- Principles of Polymerization by George Odian on page 13, and page 461
- Radiation Curing: Science and Technology (Topics in Applied Chemistry) by S. Peter Pappas on page 39, and page 349
See all 34 books this book cites
- Surface-Initiated Polymerization I (Advances in Polymer Science) (v. 1) by Rainer Jordan on page 64
- Advances in Photochemistry (Volume 29) by Douglas C. Neckers on page 351
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