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The Physics and Technology of Ion Sources
 
 
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The Physics and Technology of Ion Sources [Hardcover]

Ian G. Brown (Editor)

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Book Description

3527404104 978-3527404100 November 22, 2004 2nd, Revised and Extended Edition
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

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From the Back Cover

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

About the Author

Ian Brown is a Senior Physicist at the Lawrence Berkeley national Laboratory, Berkeley, California. His research interests include the development of plasma and ion sources and their application for materials synthesis and modification. In 1984 he established the Plasma Applications Group at the Berkeley Laboratory and was Group Leader there until his retirement in 2001. He maintains an interest in ongoing research and is actively involved in a number of collaborative research programs; his work on vacuum arc ion sources and materials surface modification has won several awards.

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Inside This Book (learn more)
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
ion implantation technology, quick field, multicusp source, driven ion sources, vacuum arc ion sources, microwave ion source, accelerator injection application, operational gas pressure, neutral cesium particles, beamlet deflection, extractable emission current density, outlet hole radius, emittance pattern, perveance match, high atomic fraction, negative hydrogen ion source, triode extraction system, beamlet steering, particle accelerator injection, contact ionizers, negative ion emission, high current ion sources, gaseous ion sources, ion production efficiency, plasma meniscus
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, International Symposium, Second Edition, International Workshop, Methods Phys, Plasma Sci, Laser Particle Beams, International Conference, Further Discussion of the Source Plasma, Proceedings of the Particle Accelerator Conference, Courtesy of Lawrence Berkeley National Laboratory, General Description, Computer Simulation of Extraction, Academic Press, Institute of Physics, Sophisticated Treatment of Ion Beam Formation, Recent Improvements, Heavy Ion Inertial Fusion, Applied Materials Corp, Internal Report, Van Nostrand, Versatility of Beam Extraction, Some Practical Ion Source Considerations, Large Volume Plasma Production, East Lansing
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
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