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Editorial Reviews
Product Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
From the Publisher
New applications call for ion beams of unprecedented energy, current, species, focus, uniformity, size, and charge states. This comprehensive, up-to-date review of the rapidly evolving field of ion source technology relates improvements to traditional ion sources and describes development of new kinds of ion sources. Physical principles, as well as their technical implementation, are covered. Chapters are self-contained, making for easy reference. --This text refers to an out of print or unavailable edition of this title.
See all Editorial Reviews
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
From the Publisher
New applications call for ion beams of unprecedented energy, current, species, focus, uniformity, size, and charge states. This comprehensive, up-to-date review of the rapidly evolving field of ion source technology relates improvements to traditional ion sources and describes development of new kinds of ion sources. Physical principles, as well as their technical implementation, are covered. Chapters are self-contained, making for easy reference. --This text refers to an out of print or unavailable edition of this title.
See all Editorial Reviews
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Inside This Book
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Key Phrases - Statistically Improbable Phrases (SIPs):
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ion implantation technology, quick field, multicusp source, driven ion sources, vacuum arc ion sources, microwave ion source, accelerator injection application, operational gas pressure, neutral cesium particles, beamlet deflection, extractable emission current density, outlet hole radius, emittance pattern, perveance match, high atomic fraction, negative hydrogen ion source, triode extraction system, beamlet steering, particle accelerator injection, contact ionizers, negative ion emission, high current ion sources, gaseous ion sources, ion production efficiency, plasma meniscus Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, International Symposium, Second Edition, International Workshop, Methods Phys, Plasma Sci, Laser Particle Beams, International Conference, Further Discussion of the Source Plasma, Proceedings of the Particle Accelerator Conference, Courtesy of Lawrence Berkeley National Laboratory, General Description, Computer Simulation of Extraction, Academic Press, Institute of Physics, Sophisticated Treatment of Ion Beam Formation, Recent Improvements, Heavy Ion Inertial Fusion, Applied Materials Corp, Internal Report, Van Nostrand, Versatility of Beam Extraction, Some Practical Ion Source Considerations, Large Volume Plasma Production, East Lansing Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
ion implantation technology, quick field, multicusp source, driven ion sources, vacuum arc ion sources, microwave ion source, accelerator injection application, operational gas pressure, neutral cesium particles, beamlet deflection, extractable emission current density, outlet hole radius, emittance pattern, perveance match, high atomic fraction, negative hydrogen ion source, triode extraction system, beamlet steering, particle accelerator injection, contact ionizers, negative ion emission, high current ion sources, gaseous ion sources, ion production efficiency, plasma meniscus Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, International Symposium, Second Edition, International Workshop, Methods Phys, Plasma Sci, Laser Particle Beams, International Conference, Further Discussion of the Source Plasma, Proceedings of the Particle Accelerator Conference, Courtesy of Lawrence Berkeley National Laboratory, General Description, Computer Simulation of Extraction, Academic Press, Institute of Physics, Sophisticated Treatment of Ion Beam Formation, Recent Improvements, Heavy Ion Inertial Fusion, Applied Materials Corp, Internal Report, Van Nostrand, Versatility of Beam Extraction, Some Practical Ion Source Considerations, Large Volume Plasma Production, East Lansing Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
17
books
cite this book:
See all 17 books citing this book
- Handbook of Ion Sources by Bernhard Wolf on 17 pages
- Atomic, Molecular, and Optical Physics: Charged Particles, Volume 29A (Experimental Methods in the Physical Sciences) by F. B. Dunning on page 165, page 187, and page 418
- Cross-Section Data, Volume 33 (Advances in Atomic, Molecular and Optical Physics) by Mitio Inokuti in Back Matter (1), and Back Matter (2)
- Handbook of Plasma Immersion Ion Implantation and Deposition by André Anders on page 453, and Back Matter
- Handbook of Vacuum Arc Science & Technology: Fundamentals and Applications (Materials Science and Process Technology Series) by Raymond L. Boxman in Back Matter (1), and Back Matter (2)
See all 17 books citing this book
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