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1 of 1 people found the following review helpful:
5.0 out of 5 stars ECR Plasma Etching, May 17, 2001
By A Customer
This review is from: Plasma Etching: Fundamentals and Applications (Semiconductor Science and Technology) (Hardcover)
One of the only books available that contain theoretical and practicle information on ECR etching. A must for any etch engineers working in the semiconductor industry.
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1 of 1 people found the following review helpful:
5.0 out of 5 stars understanding plasma processes, December 28, 2000
By A Customer
This review is from: Plasma Etching: Fundamentals and Applications (Semiconductor Science and Technology) (Hardcover)
Gives a detailed physical understanding on the fundamentals of plasma processes including Inductively Coupled Plasma and current advancements in etching processes.
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Plasma Etching: Fundamentals and Applications (Semiconductor Science and Technology)
$199.00
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