This is an updated manual covering the theory and practice of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) techniques for surface analysis. Topics covered include historical development; all relevant theory for data interpretation and a description of instrumentation; the major fields of applications, such as metallurgy, polymers, semiconductors, and corrosion science; catalysis; and many appendices of essential data for day-to-day use. This new edition also takes into account improvements in equipment, experimental procedures and data interpretation over the last seven years.
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Since the publication of the first edition, practical surface analysis has grown and diversified to such an extent that the editors have found it necessary to produce a new companion volume to cover the fields of ion and neutral spectroscopy. This first volume of the two-volume set discusses two closely related analytical techniques--Auger and X-ray photoelectron spectroscopy. Beginning with historical background of both AES and XPS, it provides in-depth examination of theory and practice of the two techniques. Information on instrumentation, spectral interpretation, depth profiling and quantification are also included. Volume II also discusses the treatment of ion and neutral techniques, but in a different manner because they have less in common than the electron spectroscopies. Volume II includes material on SIMS Instrumentation, dynamic SIMS, and SNMS (sputtered neutral mass spectrometry). Both volumes have numerous appendices.
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