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Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles (Topics in Organometallic Chemistry)
 
 
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Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles (Topics in Organometallic Chemistry) [Hardcover]

Roland A. Fischer (Editor)
1.0 out of 5 stars  See all reviews (1 customer review)

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Book Description

Topics in Organometallic Chemistry November 14, 2005

Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.


Product Details

  • Hardcover: 213 pages
  • Publisher: Springer; 1 edition (November 14, 2005)
  • Language: English
  • ISBN-10: 3540016058
  • ISBN-13: 978-3540016052
  • Product Dimensions: 9.4 x 6.1 x 0.7 inches
  • Shipping Weight: 1 pounds (View shipping rates and policies)
  • Average Customer Review: 1.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #4,465,640 in Books (See Top 100 in Books)

 

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1.0 out of 5 stars Sooo basic introduction, May 15, 2011
Disppointed... Just an basic introduction, should not be called chemistry, actually there is no chemistry inside (At least for ALD chapter). Don't recommend for others.
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Inside This Book (learn more)
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
supersaturation parameter, atomic layer deposition, cyclopentadienyl compounds, tin hydroxides, precursor chemistry, organometallic precursors, supersaturation ratio, second precursor, tin species, surface reactivity, autocatalytic effects, metal precursors, molecular precursors, tin compounds, platinum particles, molecule precursors, metal alkyls, nucleation step
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Chem Mater, Appl Phys Lett, Phys Chem, Cryst Growth, Chem Phys, Electrochem Soc, Chem Vap Deposition, Materials Chemistry of Group, Appl Surf Sci, Inorg Chem, Philippe Serp, Surface Reactivity of Transition Metal, Thin Solid Films, Adv Mater, Mater Chem, Organomet Chem, New York, Angew Chem, Mater Sci, Anorg Allg Chem, Mol Catal, Springer-Verlag Berlin Heidelberg, Chem Commun, Electrochem Solid-State Lett, Chem Ber
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