Engineering & Transportation
Qty:1
  • List Price: $209.00
  • Save: $50.14 (24%)
Only 3 left in stock (more on the way).
Ships from and sold by Amazon.com.
Gift-wrap available.
Principles of Chemical Va... has been added to your Cart
+ $3.99 shipping
Used: Very Good | Details
Sold by -usedbooks123-
Condition: Used: Very Good
Comment: Very Good Some wear on book from reading, we guarantee all purchases
Access codes and supplements are not guaranteed with used items.
Sell yours for a Gift Card
We'll buy it for $2.00
Learn More
Sell It Now
Have one to sell? Sell on Amazon
Flip to back Flip to front
Listen Playing... Paused   You're listening to a sample of the Audible audio edition.
Learn more
See this image

Principles of Chemical Vapor Deposition Hardcover – April 30, 2003

ISBN-13: 978-1402012488 ISBN-10: 1402012489 Edition: 2003rd

Buy New
Price: $158.86
20 New from $151.73 13 Used from $145.58
Amazon Price New from Used from
Hardcover
"Please retry"
$158.86
$151.73 $145.58
Free Two-Day Shipping for College Students with Amazon Student Free%20Two-Day%20Shipping%20for%20College%20Students%20with%20Amazon%20Student


Best Books of the Year
See the Best Books of 2014
Looking for something great to read? Browse our editors' picks for 2014's Best Books of the Year in fiction, nonfiction, mysteries, children's books, and much more.
NO_CONTENT_IN_FEATURE

China
Engineering & Transportation Books
Discover books for all types of engineers, auto enthusiasts, and much more. Learn more

Product Details

  • Hardcover: 273 pages
  • Publisher: Springer; 2003 edition (April 30, 2003)
  • Language: English
  • ISBN-10: 1402012489
  • ISBN-13: 978-1402012488
  • Product Dimensions: 6.1 x 0.8 x 9.2 inches
  • Shipping Weight: 15.2 ounces (View shipping rates and policies)
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #2,317,001 in Books (See Top 100 in Books)

More About the Author

Dr. Daniel M. Dobkin has been involved in high-speed communications systems and devices for over three decades. He is the author of technical books on chemical vapor deposition, RF engineering, and RFID, in addition to numerous technical publications. Dr. Dobkin holds seven US patents as inventor or co-inventor. He works as an engineering consultant and technical writer in Sunnyvale, CA.

Customer Reviews

5.0 out of 5 stars
5 star
1
4 star
0
3 star
0
2 star
0
1 star
0
See the customer review
Share your thoughts with other customers

Most Helpful Customer Reviews

8 of 9 people found the following review helpful By A Customer on June 23, 2004
Format: Hardcover
The book is a wonderful treatise on the topic of Chemical Vapor Deposition. It provides not only a sound understanding of the state-of-the art technology involved in CVD for contemporary microelectronic applications, but also enunciates the basic principles and fundamental physical laws which are necessary for a detailed understanding of the subject. I found the informal pedagogy scheme followed by the authors as an useful approach, making the complex topic interesting, while at the same time the text equips the reader with the terminology which constitutes the technical parlance on the subject. For example, the authors have (thankfully) clarified and clearly defined various terms (to mention a few) like `sccm', `diffusion length', `step coverage', `reactive sticking coefficient', `gap filling', and the various dimensionless numbers including Reynold's number, Peclet number and Knudsen number- all of which are of routine utility for the practicing technologist, but unfortunately are often not addressed in a single text on the subject.
The book addresses the various reactor technologies involved in CVD, along with the system configurations. While on the one hand, it introduces the reader to the various essential system modules and their functions in the CVD process, on the other hand, it outlines the basic physical and-chemical laws which define the different elements of the CVD reactor. The chemistry, kinetics and reaction mechanisms of silicon-dioxide and silicon-nitride deposition are covered in much detail, giving valuable insight into these two applications. Various other CVD films of importance to microelectronics are covered as well.
Read more ›
Comment Was this review helpful to you? Yes No Sending feedback...
Thank you for your feedback. If this review is inappropriate, please let us know.
Sorry, we failed to record your vote. Please try again

What Other Items Do Customers Buy After Viewing This Item?