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Principles of Plasma Discharges and Materials Processing , 2nd Edition Hardcover – April 14, 2005

ISBN-13: 978-0471720010 ISBN-10: 0471720011 Edition: 2nd

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Product Details

  • Hardcover: 800 pages
  • Publisher: Wiley-Interscience; 2 edition (April 14, 2005)
  • Language: English
  • ISBN-10: 0471720011
  • ISBN-13: 978-0471720010
  • Product Dimensions: 6.4 x 1.5 x 9.5 inches
  • Shipping Weight: 2.6 pounds (View shipping rates and policies)
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (3 customer reviews)
  • Amazon Best Sellers Rank: #444,836 in Books (See Top 100 in Books)

Editorial Reviews

Review

"The authors have done an excellent job…this is a good book for an academic course that will provide the foundation to senior-level and graduate students…" (MRS Bulletin, November2005)

From the Back Cover

A Thorough Update of the Industry Classic on Principles of PlasmaProcessing

The first edition of Principles of Plasma Discharges andMaterials Processing, published over a decade ago, was lauded forits complete treatment of both basic plasma physics and industrialplasma processing, quickly becoming the primary reference forstudents and professionals.

The Second Edition has been carefully updated and revised toreflect recent developments in the field and to further clarify thepresentation of basic principles. Along with in-depth coverage ofthe fundamentals of plasma physics and chemistry, the authors applybasic theory to plasma discharges, including calculations of plasmaparameters and the scaling of plasma parameters with controlparameters.

New and expanded topics include:

  • Updated cross sections
  • Diffusion and diffusion solutions
  • Generalized Bohm criteria
  • Expanded treatment of dc sheaths
  • Langmuir probes in time-varying fields
  • Electronegative discharges
  • Pulsed power discharges
  • Dual frequency discharges
  • High-density rf sheaths and ion energy distributions
  • Hysteresis and instabilities
  • Helicon discharges
  • Hollow cathode discharges
  • Ionized physical vapor deposition
  • Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory ofdischarges, graduate students and researchers in the field ofplasma processing should find this new edition more valuable thanever.

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Most Helpful Customer Reviews

8 of 8 people found the following review helpful By D. Berisford on January 15, 2007
Format: Hardcover
One of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas.
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By Abraham on September 17, 2014
Format: Hardcover Verified Purchase
A must have text if studying plasma science.
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0 of 1 people found the following review helpful By Jim at Lansing on January 4, 2013
Format: Hardcover Verified Purchase
A Thorough Update of the Industry Classic on Principles of Plasma Processing. Very well written. A must have book on plasma.
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