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Principles of Plasma Discharges and Materials Processing , 2nd Edition [Hardcover]

Michael A. Lieberman , Alan J. Lichtenberg
5.0 out of 5 stars  See all reviews (2 customer reviews)

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Book Description

April 14, 2005 0471720011 978-0471720010 2
A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:
* Updated cross sections
* Diffusion and diffusion solutions
* Generalized Bohm criteria
* Expanded treatment of dc sheaths
* Langmuir probes in time-varying fields
* Electronegative discharges
* Pulsed power discharges
* Dual frequency discharges
* High-density rf sheaths and ion energy distributions
* Hysteresis and instabilities
* Helicon discharges
* Hollow cathode discharges
* Ionized physical vapor deposition
* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

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Principles of Plasma Discharges and Materials Processing , 2nd Edition + Introduction to plasma physics and controlled fusion. Volume 1, Plasma physics
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Editorial Reviews

Review

"The authors have done an excellent job…this is a good book for an academic course that will provide the foundation to senior-level and graduate students…" (MRS Bulletin, November2005)

From the Back Cover

A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:

  • Updated cross sections
  • Diffusion and diffusion solutions
  • Generalized Bohm criteria
  • Expanded treatment of dc sheaths
  • Langmuir probes in time-varying fields
  • Electronegative discharges
  • Pulsed power discharges
  • Dual frequency discharges
  • High-density rf sheaths and ion energy distributions
  • Hysteresis and instabilities
  • Helicon discharges
  • Hollow cathode discharges
  • Ionized physical vapor deposition
  • Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.


Product Details

  • Hardcover: 800 pages
  • Publisher: Wiley-Interscience; 2 edition (April 14, 2005)
  • Language: English
  • ISBN-10: 0471720011
  • ISBN-13: 978-0471720010
  • Product Dimensions: 9.4 x 5.9 x 1.6 inches
  • Shipping Weight: 2.6 pounds (View shipping rates and policies)
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (2 customer reviews)
  • Amazon Best Sellers Rank: #238,636 in Books (See Top 100 in Books)

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7 of 7 people found the following review helpful
5.0 out of 5 stars outstanding plasma resource January 15, 2007
Format:Hardcover
One of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas.
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0 of 1 people found the following review helpful
5.0 out of 5 stars Excellent book January 4, 2013
Format:Hardcover|Verified Purchase
A Thorough Update of the Industry Classic on Principles of Plasma Processing. Very well written. A must have book on plasma.
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