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Principles of Lithography (SPIE PRESS Monograph Vol. PM97) [Hardcover]

Harry J. Levinson (Author)
5.0 out of 5 stars  See all reviews (1 customer review)


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Hardcover, July 2001 --  
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Book Description

0819440450 978-0819440457 July 2001
The ability to pack large numbers of individual transistors in a small area of silicon has enabled the great functionality of modern microelectronics, specifically integrated circuits. This book focuses on photolithography--the method used for patterning nearly all integrated circuits fabricated today. It is a comprehensive introduction for novice lithographers and a valuable reference for professionals.


Editorial Reviews

From the Author

This book is intended as an introduction to the science of microlithography for those new to the subject, and it covers advanced topics useful to experienced lithographers who seek information outside their own areas of expertise. Numerous references to the literature in optical lithograpy will guide both novice and experienced lithographers who want greater detail in specific areas.

A number of discussions--such as thin-resist modeling, metrics for imaging, thin-film optics, and the modeling of focus effects--first appeared in Advanced Micro Design internal reports. Eventually, parts of these reports were published elsewhere. Their tutorial nature is not coincidental, as they were analyses that I used to develop my own understanding of lithography. Complex situations often are best comprehended through simple models that describe the relevant physics, with remaining effects considered as perturbations. This is the approach I used in learning lithography and it is the method used here.

Students in my classes on lithography science will recognize many of the figures and equations. Several also appear in the first chapter of the SPIE Handbook on Microlithography, Micromachining, and Microfabrication, Volume I: Microlithography, which I coauthored with Bill Arnold of ASM Lithography. Other topics have been added or significantly expanded, especially those concerning light sources, photomasks, and next-generation lithography. The chapter on photoresists is approached from the perspective of the practicing lithographer, rather than the resist chemist. Some knowledge of resist chemistry is essential for using resists properly, but the emphasis here is on operational considerations.

About the Author

Dr. Harry J. Levinson has worked in microlithography for nearly two decades, at companies such as IBM, Sierra Semiconductor, and Advanced Micro Devices. He has published many articles on lithography science, from thin film optical effects and metrics for imaging to overlay and process control. He teaches courses in lithography science, process control, and total quality management.

Product Details

  • Hardcover: 410 pages
  • Publisher: Society of Photo Optical (July 2001)
  • Language: English
  • ISBN-10: 0819440450
  • ISBN-13: 978-0819440457
  • Product Dimensions: 9.9 x 7.5 x 1 inches
  • Shipping Weight: 1.9 pounds
  • Average Customer Review: 5.0 out of 5 stars  See all reviews (1 customer review)
  • Amazon Best Sellers Rank: #3,719,620 in Books (See Top 100 in Books)

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10 of 11 people found the following review helpful:
5.0 out of 5 stars Review of "Principles of Lithography," 2nd edition by Harry J. Levinson., March 28, 2006
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This is an excellent book for engineers, whether in photolithography or not, to acquire an overview and understanding of modern deep sub-micron photolithography and the challenges microlithographers face. It is well written and easy to read. Levinson takes you through the entire process of lithography step by step with both the mathematics involved, but also, an intuitive explanation of what the technical issues involved are. The drawings done for the figures are done well and easily understood and printed with clarity. As for photos used for figures in the book, they are also well done, and of the proper brightness and contrast so that they are easy to view and comprehensible. They are not like some books, where you wonder if the illustration was a fifth generation photocopy or just incomprehensible.

Levinson also includes a chapter on metrology. If you are producing a microlithographic pattern you need to be able to measure it, and critical dimensions in lithography are not dues ex machina.

The book has problem exercises at the end of each chapter to allow the reader to test themselves on what they have learned. I also recommend working out many of the equations as an exercise.

Levinson also doesn't neglect the historical development of the practice of lithography. There is an explanation on why early lithography tended to have high overexposure and then went to 1:1 imaging and issues driving this. Also, there is a good chapter on the claims in the 1980s that optical lithography would not get past 1 micron resolution, and why this subsequently didn't prove to be true. Levinson bravely also writes up a section on the future limits of lithography and in a few years we will see if he was right. Regardless whether he will turn out to be right or not, it is an excellent explanation of the challenges involved. I think that there is an under appreciation that of the tremendous obstacles overcome in the advancement of microlithography. It isn't an automatic step down, and we do face the prospect that maybe 65 nm or 45 nm or 32 nm or 22nm will be the end.

Next generation lithography is not neglected either and Levinson reviews the technologies and challenges for each of them.

The book is a worthy successor to David Elliot's handbook on photolithography. (Perhaps some of you will regard that as paleolithography.) It is not expensive and should be on your book shelf.

I wrote a supplementary paper in WORD for this book. I work out some of the equations in more detail than the text making it easier to understand. There are some errors in the text which I identify and provide the correction. Additionally, I added some supplementary information not in the book. If you would like a copy email me. <esebesta@tx.rr.com>.

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Inside This Book (learn more)
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Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
color plates section, engineering test stand, resist processing equipment, transverse pattern shift, lens placement errors, image log slope, lens reduction factor, overlay measurement structures, bottom lens element, mask error factor, enhanced global alignment, stepper lenses, stepper throughput, reticle errors, overlay errors, intrafield errors, measuring overlay, higher resolution optics, lithography costs, pellicle frames, quadrupole illumination, subresolution features, dipole illumination, noncritical layers, stepper manufacturers
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Solid State Technol, Microelectronics Seminar, Academic Press, Microlithography World, Applied Optics, San Jose, Semiconductor International, University of California, Canary Reticle, Laser Focus World, Proceedings of the Olin Microlithography Seminar, Year Figure, Philips Tech, Polymer Engr, Photonics Spectra, Silicon Valley Group, Position Figure, Semiconductor Lithography
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