Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.
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Book Description
Editorial Reviews
Book Description
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled.No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.
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Most Helpful Customer Reviews
3 of 3 people found the following review helpful:
5.0 out of 5 stars
Excellent resource for plasma physics,
By Andrew Christlieb (Plymouth, MI (USA)) - See all my reviews
This review is from: Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) (Hardcover)
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.
2 of 3 people found the following review helpful:
3.0 out of 5 stars
Plasma Processes for Semiconductor Fabrication,
By A Customer
This review is from: Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) (Hardcover)
This book is outstanding if you are interested in a great deal of plasma physics. If you are looking for information regarding device processing, I think that the book does not offer too much. However, there is some information on Si processing specifically.
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Front Cover | Front Flap | Table of Contents | First Pages | Index | Back Flap | Back Cover | Surprise Me!
Inside This Book
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First Sentence:
This book is intended to introduce plasma processing and technology, so that the reader can readily understand the issues involved in processing and can immediately access the state-of-the-art literature. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
nonlocal heating, elastic collisions with neutrals, elastic mfp, ion energy flux, plasma interior, sheath electric field, inelastic threshold, inelastic rates, main plasma, sheath edge, spatial cell, most energetic electrons, sheath voltage, moving cell, ionize neutrals, sheath potential, simulation particles, plasma behavior, heating region, plasma models, fixed mesh, ionization rate, plasma chemistry, processing plasmas, loss cone Key Phrases - Capitalized Phrases (CAPs): (learn more)
Monte Carlo, Water Bag, Evolution of the Trench New!
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Front Cover | Front Flap | Table of Contents | First Pages | Index | Back Flap | Back Cover | Surprise Me!
This book is intended to introduce plasma processing and technology, so that the reader can readily understand the issues involved in processing and can immediately access the state-of-the-art literature. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
nonlocal heating, elastic collisions with neutrals, elastic mfp, ion energy flux, plasma interior, sheath electric field, inelastic threshold, inelastic rates, main plasma, sheath edge, spatial cell, most energetic electrons, sheath voltage, moving cell, ionize neutrals, sheath potential, simulation particles, plasma behavior, heating region, plasma models, fixed mesh, ionization rate, plasma chemistry, processing plasmas, loss cone Key Phrases - Capitalized Phrases (CAPs): (learn more)
Monte Carlo, Water Bag, Evolution of the Trench New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Front Flap | Table of Contents | First Pages | Index | Back Flap | Back Cover | Surprise Me!
Citations (learn more)
This book cites 49
books:
See all 49 books this book cites
1
book
cites this book:
- Science and Technology (Q & A Encyclopedia) by Steve Parker on 4 pages
- Graminicolous Ascochyta species (Mycological Paper) in Front Matter, and Back Matter
- Applied Mathematics by J. David Logan in Back Matter
- Plasma Polymerization by H. Yasuda in Back Matter
- Uniform Numerical Methods for Problems with Initial and Boundary Layers by E.P. Doolan in Back Matter
See all 49 books this book cites
- The Fourth State of Matter by Shalom Eliezer in Back Matter
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