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3 of 3 people found the following review helpful:
5.0 out of 5 stars Excellent resource for plasma physics
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.
Published on June 19, 2000 by Andrew Christlieb

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2 of 3 people found the following review helpful:
3.0 out of 5 stars Plasma Processes for Semiconductor Fabrication
This book is outstanding if you are interested in a great deal of plasma physics. If you are looking for information regarding device processing, I think that the book does not offer too much. However, there is some information on Si processing specifically.
Published on June 13, 2000


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3 of 3 people found the following review helpful:
5.0 out of 5 stars Excellent resource for plasma physics, June 19, 2000
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Andrew Christlieb (Plymouth, MI (USA)) - See all my reviews
This review is from: Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) (Hardcover)
This book is an excellent tool for understanding the fundamental phenomenon that occur inside low density plasmas commonly used for semiconductor fabrication.
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2 of 3 people found the following review helpful:
3.0 out of 5 stars Plasma Processes for Semiconductor Fabrication, June 13, 2000
By A Customer
This review is from: Plasma Processes for Semiconductor Fabrication (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) (Hardcover)
This book is outstanding if you are interested in a great deal of plasma physics. If you are looking for information regarding device processing, I think that the book does not offer too much. However, there is some information on Si processing specifically.
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