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Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing
 
 
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Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing [Hardcover]

Tadahiro Ohmi (Editor)

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Book Description

0849335434 978-0849335433 December 21, 2005 1
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays.

This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities.

Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.

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Inside This Book (learn more)
First Sentence:
The author describes molecular behavior in many aspects by means of the hydrogen atomic model, as there is no general theoretical equation of molecular bond energy. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
reclaimed developer, shower type nozzles, microroughness increase, surface microroughness, average microroughness, nonselective etching, ultrapure water quality, spray electrification, spin cleaning, wet process technology, etched contact hole, gate insulator film, ultrapure water treatment, ultrapurified water, megasonic power, developer waste, ultrapure water system, gas ambience, high particle removal efficiency, low relative dielectric, ultra clean technology, dissolved hydrogen concentration, native oxide growth, hydrogenated water, ultraclean surface
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Electrochemical Society Proceedings Series, Extended Abstracts, Santa Clara, International Symposium, Tohoku University, Electron Devices, Ultra Clean Society, Electrochemical Society Meeting, Japan Patent, Mitsubishi Chemical Corporation, Solid State Phenomena, The Electrochemical Society, International Conference, Measurement of Electrostatic Charge, Neutralizing Spray Electrification, New York, Technical Digest, Colloid Interface Sci, Materials Research Society Symposium Proceedings, Meeting of Electro-chemical Society, Meeting of Electrochemical Society, Nikkan Kogyo Shimbun Ltd, Oppm Dissolved Oxygen, San Jose, Seiko Instruments Inc
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