This book examines and projects the critical technologies involved in the fabrication of very large scale integration (VLSI) semiconductor devices, including their likely developments, why and when their introduction or demise will take place, what problems and choices are facing the industry, and where the opportunities and pitfalls may exist. Written from an industry perspective, this book emphasizes the most rapid technological advances in the semiconductor industry, and addresses the strategic issues impacting both the user and the supplier of chemicals, materials and equipment. The book assists the reader in evaluating the spectrum of products and systems available for use at every crucial stage in the processing of an advanced integrated circuit (IC) device. To the suppliers, the book offers insight for future user needs and will assist them in long-range planning, and new product development and improvement. Topics discussed in detail include contamination control; thin film deposition and et
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Inside This Book
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First Sentence:
From an economic standpoint, all ICs have a common need for arbitrarily small size and thus low cost per function. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
laser pantography, single wafer systems, hexode reactor, optical pattern generator, mask repair, overlay accuracy, fab area, aluminum etching, optical steppers, projection aligners, reactor cleaning, critical impurities, submicron features, endpoint detection, laser marking, etching systems, tungsten silicide, clear defects, dry processing, registration accuracy, step coverage, mask levels, reactive ion etching, plasma etching, particulate levels Key Phrases - Capitalized Phrases (CAPs): (learn more)
Solid State Technology, Semiconductor International, Santa Clara, Bell Labs, Texas Instruments, New York, Bell Laboratories, Karl Suss, Photonics Spectra, Super Premium, Thin Solid Films, Brookhaven National Laboratory, East Fishkill, General Signal, International Electron Devices Meeting, Laser Focus World, Microelectronic Materials, Olin Hunt, San Francisco, San Jose, Schematic of X-ray, The Waferwriter, Tokyo Ohka New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
From an economic standpoint, all ICs have a common need for arbitrarily small size and thus low cost per function. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
laser pantography, single wafer systems, hexode reactor, optical pattern generator, mask repair, overlay accuracy, fab area, aluminum etching, optical steppers, projection aligners, reactor cleaning, critical impurities, submicron features, endpoint detection, laser marking, etching systems, tungsten silicide, clear defects, dry processing, registration accuracy, step coverage, mask levels, reactive ion etching, plasma etching, particulate levels Key Phrases - Capitalized Phrases (CAPs): (learn more)
Solid State Technology, Semiconductor International, Santa Clara, Bell Labs, Texas Instruments, New York, Bell Laboratories, Karl Suss, Photonics Spectra, Super Premium, Thin Solid Films, Brookhaven National Laboratory, East Fishkill, General Signal, International Electron Devices Meeting, Laser Focus World, Microelectronic Materials, Olin Hunt, San Francisco, San Jose, Schematic of X-ray, The Waferwriter, Tokyo Ohka New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 4
books:
- Excimer Lasers (Topics in Applied Physics) by Charles K. Rhodes on page 225
- The Physics of Microfabrication by Ivor Brodie on page 199
- Thin Film Phenomena by Kasturi Lal Chopra on page 199
- Great Britain (Discovering Cultures) by Sharon Gordon in Front Matter
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