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Editorial Reviews
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"The region of the electromagnetic spectrum covered by this excellently written and produced book has only become available to exploitation over the last couple of decades or so...every researcher, teacher and student involved with the generation, manipulation or applications of electromagnetic radiation in this part of the spectrum should make space on their desk (not the bookshelf, since it won't spend much time there!) for this wonderful addition to the literature." Contemporary Physics
Product Description
This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.
"The region of the electromagnetic spectrum covered by this excellently written and produced book has only become available to exploitation over the last couple of decades or so...every researcher, teacher and student involved with the generation, manipulation or applications of electromagnetic radiation in this part of the spectrum should make space on their desk (not the bookshelf, since it won't spend much time there!) for this wonderful addition to the literature." Contemporary Physics
Product Description
This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.
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Inside This Book
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Key Phrases - Statistically Improbable Phrases (SIPs):
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relative spectral bandwidth, undulator equation, outer zone width, undulator condition, pinhole spatial filtering, zone plate lens, glancing incidence optics, order sorting aperture, wiggler radiation, critical photon energy, electron beam divergence, harmonic merging, periodic magnet structure, undulator radiation, bending magnet radiation, multilayer coated optics, given undulator, inverted population density, radiation cone, complex atomic scattering factor, multilayer interference coatings, polarizing undulator, modern storage rings, extreme ultraviolet lithography, coherent power Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Lawrence Livermore National Laboratory, Advanced Light Source, Cambridge Univ, Lawrence Berkeley National Laboratory, Academic Press, Third Edition, Stony Brook, University of California, Oxford Univ, Modern Physics, Seventh Edition, Brookhaven National Laboratory, Laser Program Annual Report, Principles of Optics, Vacuum Ultraviolet Spectroscopy, Classical Electrodynamics, Semiconductor Industry Association, University of Wisconsin-Madison, Data Tables, Lord Rayleigh, San Jose, Fifth Edition, Following Hofmann, Marcel Dekker New!
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Front Cover | Table of Contents | First Pages | Index | Surprise Me!
relative spectral bandwidth, undulator equation, outer zone width, undulator condition, pinhole spatial filtering, zone plate lens, glancing incidence optics, order sorting aperture, wiggler radiation, critical photon energy, electron beam divergence, harmonic merging, periodic magnet structure, undulator radiation, bending magnet radiation, multilayer coated optics, given undulator, inverted population density, radiation cone, complex atomic scattering factor, multilayer interference coatings, polarizing undulator, modern storage rings, extreme ultraviolet lithography, coherent power Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Lawrence Livermore National Laboratory, Advanced Light Source, Cambridge Univ, Lawrence Berkeley National Laboratory, Academic Press, Third Edition, Stony Brook, University of California, Oxford Univ, Modern Physics, Seventh Edition, Brookhaven National Laboratory, Laser Program Annual Report, Principles of Optics, Vacuum Ultraviolet Spectroscopy, Classical Electrodynamics, Semiconductor Industry Association, University of Wisconsin-Madison, Data Tables, Lord Rayleigh, San Jose, Fifth Edition, Following Hofmann, Marcel Dekker New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Surprise Me!
Citations (learn more)
2
books
cite this book:
- Handbook of Space Astronomy and Astrophysics by Dr Martin V. Zombeck in Back Matter
- Electrostatic Accelerators: Fundamentals and Applications (Particle Acceleration and Detection) by Ragnar Hellborg on page 47
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