Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description of the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.
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4 of 5 people found the following review helpful:
5.0 out of 5 stars
Good book for a beginner in thin film deposition,
This review is from: Thin-Film Deposition: Principles and Practice (Hardcover)
I recommend this book to anyone who is interested in process technologies that are used in chipmaking. The chapters are organized well and points are explained in a clear concise way. I am a chemistry major and this book helped me get started in my first job in a chipmaking company.
4.0 out of 5 stars
Top notch book on thin films,
This review is from: Thin-Film Deposition: Principles and Practice (Hardcover)
My Ph.D. research was in thin films and this is the only book that I keep at my desk. I give it to the new employees that I mentor as an into to all major deposition techniques. It does need to be updated though. It does not include many of the newer techniques such a pulsed DC sputtering, cathodic arc deposition, ect. If your getting into thin films, this is an excellent into book.
0 of 4 people found the following review helpful:
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Inside This Book
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First Sentence:
Thin films are deposited onto bulk materials (substrates) to achieve properties unattainable or not easily attainable in the substrates alone. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
macroparticle ejection, arriving vapor, quenched growth, impingement flux, electron energy gain, depositing vapor, film conformality, axisymmetric reactor, sheath voltage drop, sheath width, subsurface effects, arrival flux, film being deposited, native point defects, depositing film, sheath field, depositing species, surface diffusion length, driven electrode, flux monitoring, sputtered particles, fractional surface coverage, cathode sheath, film purity, bombardment energy Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Molecular Beam Epitaxy, Academic Press, Park Ridge, Plasma Processing, Noyes Publications, Thin Solid Films, John Wiley, Boca Raton, Materials Research Society, Pergamon Press, American Chemical Society, Frequency Effects, Plasma Science, Handbook of Metal Etchants, Physics Res, Tables of Chemical Thermodynamic, Thermochemical Tables New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Thin films are deposited onto bulk materials (substrates) to achieve properties unattainable or not easily attainable in the substrates alone. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
macroparticle ejection, arriving vapor, quenched growth, impingement flux, electron energy gain, depositing vapor, film conformality, axisymmetric reactor, sheath voltage drop, sheath width, subsurface effects, arrival flux, film being deposited, native point defects, depositing film, sheath field, depositing species, surface diffusion length, driven electrode, flux monitoring, sputtered particles, fractional surface coverage, cathode sheath, film purity, bombardment energy Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Molecular Beam Epitaxy, Academic Press, Park Ridge, Plasma Processing, Noyes Publications, Thin Solid Films, John Wiley, Boca Raton, Materials Research Society, Pergamon Press, American Chemical Society, Frequency Effects, Plasma Science, Handbook of Metal Etchants, Physics Res, Tables of Chemical Thermodynamic, Thermochemical Tables New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 47
books:
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8
books
cite this book:
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- Chemical Vapor Deposition (06682G) by Jong-Hee Park on page 366, page 452, and page 556
- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on page 34, and page 218
- The Feynman Lectures on Physics: Commemorative Issue, Three Volume Set by Richard P. Feynman on page 450, and page 554
- Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18) by Maurice H. Francombe on page 556, and page 587
- Dislocations in Solids, Volume 11 (Dislocations in Solids S.) by Frank R.N. Nabarro on page 306
See all 47 books this book cites
- Industrial Plasma Engineering - 2 Volume Set: Industrial Plasma Engineering: Applications (v. 2) by J Reece Roth on 4 pages
- Semiconductor Nanostructures for Optoelectronic Applications (Artech House Semiconductor Materials and Devices Library) by Todd D. Steiner on page 226
- Nanoengineering of Structural, Functional and Smart Materials by Mark J. Schulz on page 155
- Thin Film Technology Handbook by Aicha Eishabini-Riad on page 38
- Specimen Handling, Preparation, and Treatments in Surface Characterization (Methods of Surface Characterization) by Alvin W. Czanderna in Back Matter
See all 8 books citing this book
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