An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
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About the Author
Dr. Wasa brings to this book over 40 years experience in the fields of radiation damage, gas discharge, plasma, cathodic sputtering and thin film technology with Matsushita Electric, Ltd. and Yokohama City University. A Ph.D. from Osaka University, his honors in surface science include awards from Japan and the United States. He has made seminal contributions to magnetron sputtering and developed numerous thin film materials and electronic devices including ZnO, diamond, and high-Tc superconducting thin films. Life Fellow of IEEE.
Dr. Kitabatake has studied a synthesis of novel materials by sputtering at Matsushita Electric, Ltd. and University of Illinois. He got Ph.D. from Tohoku University. He has seminal work in the low temperature growth of carbides and nitrides by ion beam sputtering. He has a seminal work on a growth of cubic diamond at room temperature and silicon carbide semiconducting devices.
Dr. Adachi has studied a growth process of oxide compound thin films at Matsushita Electric, Ltd. A Ph.D. from Tohoku University, his honors in thin film materials include awards from Japan. He has seminal contribution to a synthesis of single crystal perovskite thin films and man-made superlattice of perovskite by sputtering. He has given a pioneer work in PLZT electro-optic switches, man-made high-Tc superconductors, and magnetic oxide devices.
Dr. Kitabatake has studied a synthesis of novel materials by sputtering at Matsushita Electric, Ltd. and University of Illinois. He got Ph.D. from Tohoku University. He has seminal work in the low temperature growth of carbides and nitrides by ion beam sputtering. He has a seminal work on a growth of cubic diamond at room temperature and silicon carbide semiconducting devices.
Dr. Adachi has studied a growth process of oxide compound thin films at Matsushita Electric, Ltd. A Ph.D. from Tohoku University, his honors in thin film materials include awards from Japan. He has seminal contribution to a synthesis of single crystal perovskite thin films and man-made superlattice of perovskite by sputtering. He has given a pioneer work in PLZT electro-optic switches, man-made high-Tc superconductors, and magnetic oxide devices.
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Inside This Book
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First Sentence:
Thin films are fabricated by the deposition of individual atoms on a substrate. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
typical sputtering conditions, postannealing process, epitaxial temperature, crystallizing temperature, target surface atoms, compound thin films, perovskite thin films, sputtering system, activated reactive evaporation, sputter power, nanometer materials, critical oxygen pressure, vicinal substrates, sputtering discharge, metallic mode, various substrate temperatures, low working pressure, sputtering phenomena, ion beam sputter, sputtering gas pressure, miscut angle, direct sputtering, magnetron cathode, alumina wafer, sputter system Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Substrate Substrate Temp, Thin Solid Films, Deposition Conditions Materials Structure, Rate Film Properties, Technology Table, John Wiley, Noyes Publications, Electrons Electrons, Particle Bombardment, Springer Verlag, Academic Press, Ovo Buturi, San Diego, Sonics Ultrason, Vacuum Figure, Arkansas Univ, Deposition Rate Factor, Ions Ions, Monte Carlo, Osaka Univ, Paschen's Law, Substrate Sapphire, Ultrasonic Svmp New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Thin films are fabricated by the deposition of individual atoms on a substrate. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
typical sputtering conditions, postannealing process, epitaxial temperature, crystallizing temperature, target surface atoms, compound thin films, perovskite thin films, sputtering system, activated reactive evaporation, sputter power, nanometer materials, critical oxygen pressure, vicinal substrates, sputtering discharge, metallic mode, various substrate temperatures, low working pressure, sputtering phenomena, ion beam sputter, sputtering gas pressure, miscut angle, direct sputtering, magnetron cathode, alumina wafer, sputter system Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Substrate Substrate Temp, Thin Solid Films, Deposition Conditions Materials Structure, Rate Film Properties, Technology Table, John Wiley, Noyes Publications, Electrons Electrons, Particle Bombardment, Springer Verlag, Academic Press, Ovo Buturi, San Diego, Sonics Ultrason, Vacuum Figure, Arkansas Univ, Deposition Rate Factor, Ions Ions, Monte Carlo, Osaka Univ, Paschen's Law, Substrate Sapphire, Ultrasonic Svmp New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 13
books:
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- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on 8 pages
- Thin Film Processes by John L. Vossen on 4 pages
- Thin Film Technology Handbook by Aicha Eishabini-Riad on page 14, page 66, and page 400
- Physical Vapor Deposition of Thin Films by John E. Mahan on page 66, page 67, and page 113
- Superconducting and Related Oxides: Physics and Nanoengineering IV (Proceedings of Spie) by Davor Pavuna on page 461, and page 462
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