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Thin Films Material Technology: Sputtering of Compound Materials [Hardcover]

Kiyotaka Wasa (Author), Makoto Kitabatake (Author), Hideaki Adachi (Author)


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Book Description

September 23, 2004 3540211187 978-3540211181 1

An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin film, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts.

Key topics: Principles and examples of making thin-film materials and devices such as nanometer composite thin films, nanometer superlattice of compound ceramics, micro-sensors and actuators, micro-MEMS, mobile compact/flexible ferroelectric memory, flat display including plasma display and PLD, and thin film catalysis, solar battery, and large-area functional window glass coating for energy and environmental uses; Covers techniques in automotive parts coatings :non-peel plastics coatings with metal, alloy, and compound films.


Editorial Reviews

Review

From the reviews:

"The book starts by defining thin film materials and describing the basics of their nucleation and growth. … I found the book useful and would not hesitate to recommend it as essential reading to anyone who is entering the field of sputter deposition, particularly the deposition of compound materials." (Dr. Charles A. Bishop, Materials World, Vol. 14 (10), 2006)


Product Details

  • Hardcover: 518 pages
  • Publisher: Springer; 1 edition (September 23, 2004)
  • Language: English
  • ISBN-10: 3540211187
  • ISBN-13: 978-3540211181
  • Product Dimensions: 9.1 x 6.2 x 1.5 inches
  • Shipping Weight: 2.2 pounds
  • Amazon Best Sellers Rank: #6,485,781 in Books (See Top 100 in Books)

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Inside This Book (learn more)
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
typical sputtering conditions, multitarget sputtering system, evaporated gas molecules, compound thin films, epitaxial temperature, thermistor coefficient, target surface atoms, postannealing process, sputtering phenomena, crystallizing temperature, perovskite thin films, diode sputtering system, activated reactive evaporation, beam sputtering system, sputter power, critical oxygen pressure, magnetron sputtering system, vicinal substrates, metallic mode, sputtering gas pressure, ion beam sputter, miscut angle, alumina wafer, nanometer materials, sputtering discharge
Key Phrases - Capitalized Phrases (CAPs): (learn more)
Thin Film Materials Technology, Deposition of Compound Thin Films, New York, Thin Solid Films, Rate Film Properties, Substrate Substrate Temp, Deposition Conditions Materials Structure, Particle Bombardment, John Wiley, Noyes Publications, Electrons Electrons, Springer Verlag, Academic Press, Ovo Buturi, San Diego, Sonics Ultrason, Thin Filnr, Vacuum Figure, Arkansas Univ, Paschen's Law, Deposition Method, Ions Ions, Monte Carlo, Osaka Univ, Wave Number
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
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