The first textbook to be published for this subject area, this text is aimed at senior level and graduate courses in ULSI technology. This text follows the tradition of Sze's highly successful pioneering text on VLSI technology, and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature processes, rapid thermal processes, low damage plasma reactive ion etching, fine line lithography, cleaning technology, clean room technology, packing and reliability. As both editors and authors, Chang and Sze have contributed both academic expertise, as well as editorial expertise, to create a cohesive and user-friendly text out of each state-of-the-art subject area.
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Most Helpful Customer Reviews
15 of 15 people found the following review helpful:
2.0 out of 5 stars
Not a book but a collection of review articles,
By A Customer
This review is from: ULSI Technology (Hardcover)
The problem with the book is that it is not a book at all: it is a collection of 12 articles which vary enormously in their style and level. Some are excellent, like Richard Fair's RTP chapter, but many are run-of-the-mill reviews. A welcomed addition is that wafer cleaning and clean room technology have chapters of their own, usually they tend to be regarded as side issues. Editors have not syncronized the chapters: planarization is discussed twice: in both CVD and process integration chapters and silicides three times: in RTP, metallization and process integration. The book is not specifically about ULSI: it is a general overview of silicon (mostly MOS) process technologies, or at least I do not consider molecular beam epitaxy, contact lithography or bias sputtered quartz as ULSI technologies. Maybe this is for textbook completeness, but then why is oxidation absent ? The intended audience of this book remains a mystery to me: in the preface it is described as a textbook (for senior undergraduates or first year graduate students) but the structure of the book does not support a fabrication course because many essential items have been left out: e.g. oxidation and ion implantation. Most chapters contain 50-100 references to literature, but to old literature: process integration chapter ("totally revised and updated") average date of references is 1987, with only a handful of 1990's articles.
3 of 4 people found the following review helpful:
3.0 out of 5 stars
Sze did not write this!!!!!!!!!!!!!!!!!!!!!!,
By A Customer
This review is from: VLSI Technology (Hardcover)
This book is merely a collection of articles written by various authorities in the field. Sze probably put the end of chapter problems in it (most of which are challenging) which do not closely reflect the chapter's theme. In that sense, this is a BAD book - the correlation is awful. As far as just reading the chapters, some of the chapters are well written and this book merits 3 stars. I think it is safe to say there are better books (real textbooks by one or two authors) out there pertaining to the field of VLSI Fabrication.
0 of 1 people found the following review helpful:
5.0 out of 5 stars
Excellent quality,
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This review is from: VLSI Technology (Hardcover)
The seller honestly ranks the book as "Good".
Actually, it likes a brand new book. Thank you
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