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A User's Guide to Vacuum Technology
 
 
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A User's Guide to Vacuum Technology [Hardcover]

John F. O'Hanlon (Author)
4.7 out of 5 stars  See all reviews (7 customer reviews)

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Book Description

0471270520 978-0471270522 July 4, 2003 3
In the decade and a half since the publication of the Second Edition of A User?s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today?s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User?s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.

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Editorial Reviews

Review

"...an excellent handbook for engineers, scientists, or anybody who uses vacuum systems on a regular basis." (IEEE Circuits & Devices Magazine, May/June 2005)

"...clearly written with...many helpful hints...highly recommended." (MRS Bulletin, January 2005)

"This book sucks in a good way…the third edition will never get dusty on my bookshelf…although the text is certainly not coffee-table reading material, it will have a wide appeal…it is particularly valuable as a reference for those who work practically with vacuum technologies and a must-buy for those who design them." (JOM, February 26, 2004)

"...a fundamental understanding of modern vacuum technology and a practical user's perspective of laboratory and industrial vacuum technology. This edition, while still providing core information in a very practical style...covers many new advances in the field...there are loads of graphs, data, and tables to provide practical and useful information to the vacuum user." (IEEE Electrical Insulation Magazine)

From the Publisher

An introduction to the theory and practice of modern vacuum technology, with applications. Focuses on the understanding, operation, and selection of equipment for vacuum processes used in semiconductor, optical, and related technologies. This 2nd Edition has new information on components, lubrication, pump fluids, and other materials. Basic characteristics and operational procedures are given for each high-vacuum pumping system. --This text refers to an out of print or unavailable edition of this title.

Product Details

  • Hardcover: 536 pages
  • Publisher: Wiley-Interscience; 3 edition (July 4, 2003)
  • Language: English
  • ISBN-10: 0471270520
  • ISBN-13: 978-0471270522
  • Product Dimensions: 9.5 x 6.3 x 1.2 inches
  • Shipping Weight: 1.9 pounds (View shipping rates and policies)
  • Average Customer Review: 4.7 out of 5 stars  See all reviews (7 customer reviews)
  • Amazon Best Sellers Rank: #150,242 in Books (See Top 100 in Books)

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Customer Reviews

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Average Customer Review
4.7 out of 5 stars (7 customer reviews)
 
 
 
 
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3 of 3 people found the following review helpful:
5.0 out of 5 stars everyone in semiconductor industrie must read this book, September 3, 2005
This review is from: A User's Guide to Vacuum Technology (Hardcover)
Since I work in a very big semi' fab as field service engineer I looking for a good description of any tool part's on several manufacturing machines. But i work in Germany and it isn't so easy to find much more and better information as for an student without experience. It is my second book about vakuum technologie, all new kinds of engineering and also standard technologie is well prepaired in this issue. Some description of Pump's could be better or more funktionplan's , but all in one book is maybe too much. I was very surprised of this universal Handbook for engineer's and technician, best offer for all who need information about PVD, CVD, Implant vakuum etc. A lot of basic's in introduction part, well to understand, intresting gas properties, cluster technologie and last but not least - a big appendix with all what you need , very fine. Thank's for this good book.
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5 of 6 people found the following review helpful:
5.0 out of 5 stars Execellent, practical and comprehensive reference book., May 16, 1997
By A Customer
I borrowed this book from a colleague here at Applied Materials. After looking at it for a few minutes, I offered to buy it from him. Of course, he refused. So here I am at Amazon (physically at work) to purchase the book. It is extremely practical and I intend to keep it here at work as a reference for problems I encounter. By the way, my web address is http://www.netcom.com/~kvick/main.html. Please feel free to visit or email me
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1 of 1 people found the following review helpful:
3.0 out of 5 stars Have your calculator handy..., January 8, 2010
By 
C. Gustafson (West Shore of Michigan, USA) - See all my reviews
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This review is from: A User's Guide to Vacuum Technology (Hardcover)
If you like SI units, you're probably going to love this book. Very exhaustive coverage of vacuum technology. Unfortunately for those of us who are not anal retentive and thus prefer to use the common lingo of high vacuum - Torr and microns - every discussion is in pascals. The book starts with a lengthy diatribe on units other than pascals, the first hint of the treat you're in for. It appears the author is on a one man crusade to convert all of us. Had I known this I certainly would not have purchased the book. Good info, in a very cumbersome form. Remember the number 133. You're going to use it a lot if you buy this book.
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Inside This Book (learn more)
First Sentence:
Torricelli is credited with the conceptual understanding of the vacuum within a mercury column by 1643. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
critical forepressure, critical inlet pressure, flow leak detector, outdiffusion rate, closed ion source, mechanical pump fluids, pentaphenyl ether, water pumping speed, ultraclean chambers, hydrogen pumping speed, roughing line, foreline valve, claw pump, crossover pressure, miniature quadrupoles, triode pump, test dome, cryosorption pumping, ultrahigh vacuum region, high vacuum valve, single blade row, lobe blower, helium gas refrigerator, thermal conductivity gauge, staging ratio
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Monte Carlo, Pergamon Press, Palo Alto, Varian Associates, Hansen Way, Pfeiffer Vakuumtechnik, The Institute of Physics, Mass Spectrometry, Nitrogen Flow Rate, Van Atta, Varian Report, Applied Materials, Bonner Str, Francaise des Ingeneiurs, Indicated Pressure, Industrial Research, John Wiley, Leybold Vakuum, Santa Clara, The American Institute of Physics, Vacuum Symp, Viton O-ring, Colfax Ave, Good Mod Very
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