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A User's Guide to Vacuum Technology [Hardcover]

John F. O'Hanlon (Author)
4.7 out of 5 stars  See all reviews (7 customer reviews)


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Hardcover $110.21  
Hardcover, April 24, 1989 --  
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A User's Guide to Vacuum Technology A User's Guide to Vacuum Technology 4.7 out of 5 stars (7)
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Book Description

April 24, 1989 0471812420 978-0471812425 2
An introduction to the theory and practice of modern vacuum technology, with applications. Focuses on the understanding, operation, and selection of equipment for vacuum processes used in semiconductor, optical, and related technologies. This 2nd Edition has new information on components, lubrication, pump fluids, and other materials. Basic characteristics and operational procedures are given for each high-vacuum pumping system.


Editorial Reviews

Review

"...an excellent handbook for engineers, scientists, or anybody who uses vacuum systems on a regular basis." (IEEE Circuits & Devices Magazine, May/June 2005)

"...clearly written with...many helpful hints...highly recommended." (MRS Bulletin, January 2005)

"This book sucks in a good way…the third edition will never get dusty on my bookshelf…although the text is certainly not coffee-table reading material, it will have a wide appeal…it is particularly valuable as a reference for those who work practically with vacuum technologies and a must-buy for those who design them." (JOM, February 26, 2004)

"...a fundamental understanding of modern vacuum technology and a practical user's perspective of laboratory and industrial vacuum technology. This edition, while still providing core information in a very practical style...covers many new advances in the field...there are loads of graphs, data, and tables to provide practical and useful information to the vacuum user." (IEEE Electrical Insulation Magazine) --This text refers to an alternate Hardcover edition.

From the Publisher

An introduction to the theory and practice of modern vacuum technology, with applications. Focuses on the understanding, operation, and selection of equipment for vacuum processes used in semiconductor, optical, and related technologies. This 2nd Edition has new information on components, lubrication, pump fluids, and other materials. Basic characteristics and operational procedures are given for each high-vacuum pumping system.

Product Details

  • Hardcover: 512 pages
  • Publisher: Wiley-Interscience; 2 edition (April 24, 1989)
  • Language: English
  • ISBN-10: 0471812420
  • ISBN-13: 978-0471812425
  • Product Dimensions: 9.1 x 6.1 x 1.3 inches
  • Shipping Weight: 1.9 pounds
  • Average Customer Review: 4.7 out of 5 stars  See all reviews (7 customer reviews)
  • Amazon Best Sellers Rank: #1,432,661 in Books (See Top 100 in Books)

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Customer Reviews

7 Reviews
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Average Customer Review
4.7 out of 5 stars (7 customer reviews)
 
 
 
 
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Most Helpful Customer Reviews

3 of 3 people found the following review helpful:
5.0 out of 5 stars everyone in semiconductor industrie must read this book, September 3, 2005
Since I work in a very big semi' fab as field service engineer I looking for a good description of any tool part's on several manufacturing machines. But i work in Germany and it isn't so easy to find much more and better information as for an student without experience. It is my second book about vakuum technologie, all new kinds of engineering and also standard technologie is well prepaired in this issue. Some description of Pump's could be better or more funktionplan's , but all in one book is maybe too much. I was very surprised of this universal Handbook for engineer's and technician, best offer for all who need information about PVD, CVD, Implant vakuum etc. A lot of basic's in introduction part, well to understand, intresting gas properties, cluster technologie and last but not least - a big appendix with all what you need , very fine. Thank's for this good book.
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5 of 6 people found the following review helpful:
5.0 out of 5 stars Execellent, practical and comprehensive reference book., May 16, 1997
By A Customer
This review is from: A User's Guide to Vacuum Technology (Hardcover)
I borrowed this book from a colleague here at Applied Materials. After looking at it for a few minutes, I offered to buy it from him. Of course, he refused. So here I am at Amazon (physically at work) to purchase the book. It is extremely practical and I intend to keep it here at work as a reference for problems I encounter. By the way, my web address is http://www.netcom.com/~kvick/main.html. Please feel free to visit or email me
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1 of 1 people found the following review helpful:
3.0 out of 5 stars Have your calculator handy..., January 8, 2010
By 
C. Gustafson (West Shore of Michigan, USA) - See all my reviews
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If you like SI units, you're probably going to love this book. Very exhaustive coverage of vacuum technology. Unfortunately for those of us who are not anal retentive and thus prefer to use the common lingo of high vacuum - Torr and microns - every discussion is in pascals. The book starts with a lengthy diatribe on units other than pascals, the first hint of the treat you're in for. It appears the author is on a one man crusade to convert all of us. Had I known this I certainly would not have purchased the book. Good info, in a very cumbersome form. Remember the number 133. You're going to use it a lot if you buy this book.
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Inside This Book (learn more)
First Sentence:
Galileo was the first person to create a partial vacuum, and he did so with a piston. Read the first page
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
critical forepressure, critical inlet pressure, sublimation trap, pentaphenyl ether, tubulated gauge, mechanical pump fluids, ion gauge tube, chlorofluorocarbon fluids, backstreaming rate, roughing line, hydrogen pumping speed, foreline valve, high vacuum valve, triode pump, cryosorption pumping, low vacuum range, mechanical pump oil, ultrahigh vacuum region, roughing valve, gas flow applications, test dome, diffusion pump fluids, thermal conductivity gauge, helium gas refrigerator, lobe blower
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Pergamon Press, The American Vacuum Society, West Germany, Varian Associates, Palo Alto, Monte Carlo, Hansen Way, Dow Corning, Uthe Technology Inc, John Wiley, Mathilda Avenue, Pfeiffer Vakuumtechnik, Industrial Research, The Institute of Physics, Van Atta, Varian Report, Balzers High Vacuum, Pennwalt Corp, Scientific Foundations of Vacuum Technique, Techniciens du Vide, The American Institute of Physics, Vacuum Symp, West Palm Beach, Dow Center
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