- Paperback: 676 pages
- Publisher: McGraw-Hill Education Singapore; 2nd edition (May 1, 1988)
- Language: English
- ISBN-10: 0071003479
- ISBN-13: 978-0071003476
- Product Dimensions: 21.6 x 11.8 x 5.9 inches
- Shipping Weight: 1.8 pounds
- Average Customer Review: 3.6 out of 5 stars See all reviews (5 customer reviews)
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Very Large Scale Integration Technology 2nd Edition
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Top Customer Reviews
The book is not specifically about ULSI: it is a general overview of silicon (mostly MOS) process technologies, or at least I do not consider molecular beam epitaxy, contact lithography or bias sputtered quartz as ULSI technologies. Maybe this is for textbook completeness, but then why is oxidation absent ?
The intended audience of this book remains a mystery to me: in the preface it is described as a textbook (for senior undergraduates or first year graduate students) but the structure of the book does not support a fabrication course because many essential items have been left out: e.g. oxidation and ion implantation.
Most chapters contain 50-100 references to literature, but to old literature: process integration chapter ("totally revised and updated") average date of references is 1987, with only a handful of 1990's articles.
anyway that was a good buy
Actually, it likes a brand new book.