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Very Large Scale Integration Technology Paperback – May 1, 1988

ISBN-13: 978-0071003476 ISBN-10: 0071003479 Edition: 2nd

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Product Details

  • Paperback: 676 pages
  • Publisher: McGraw-Hill Education Singapore; 2nd edition (May 1, 1988)
  • Language: English
  • ISBN-10: 0071003479
  • ISBN-13: 978-0071003476
  • Product Dimensions: 21.6 x 11.8 x 5.9 inches
  • Shipping Weight: 1.8 pounds
  • Average Customer Review: 3.6 out of 5 stars  See all reviews (5 customer reviews)
  • Amazon Best Sellers Rank: #6,793,489 in Books (See Top 100 in Books)

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Customer Reviews

3.6 out of 5 stars
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Most Helpful Customer Reviews

16 of 16 people found the following review helpful By A Customer on March 22, 2000
Format: Hardcover
The problem with the book is that it is not a book at all: it is a collection of 12 articles which vary enormously in their style and level. Some are excellent, like Richard Fair's RTP chapter, but many are run-of-the-mill reviews. A welcomed addition is that wafer cleaning and clean room technology have chapters of their own, usually they tend to be regarded as side issues. Editors have not syncronized the chapters: planarization is discussed twice: in both CVD and process integration chapters and silicides three times: in RTP, metallization and process integration.
The book is not specifically about ULSI: it is a general overview of silicon (mostly MOS) process technologies, or at least I do not consider molecular beam epitaxy, contact lithography or bias sputtered quartz as ULSI technologies. Maybe this is for textbook completeness, but then why is oxidation absent ?
The intended audience of this book remains a mystery to me: in the preface it is described as a textbook (for senior undergraduates or first year graduate students) but the structure of the book does not support a fabrication course because many essential items have been left out: e.g. oxidation and ion implantation.
Most chapters contain 50-100 references to literature, but to old literature: process integration chapter ("totally revised and updated") average date of references is 1987, with only a handful of 1990's articles.
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4 of 5 people found the following review helpful By A Customer on May 9, 2002
Format: Hardcover
This book is merely a collection of articles written by various authorities in the field. Sze probably put the end of chapter problems in it (most of which are challenging) which do not closely reflect the chapter's theme. In that sense, this is a BAD book - the correlation is awful. As far as just reading the chapters, some of the chapters are well written and this book merits 3 stars. I think it is safe to say there are better books (real textbooks by one or two authors) out there pertaining to the field of VLSI Fabrication.
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0 of 2 people found the following review helpful By Saeed Gharagozlian on April 22, 2009
Format: Hardcover
i think i bought it because it was written NEW but i reckon it has been used! but still in amazingly good condition!
anyway that was a good buy
thanks
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0 of 2 people found the following review helpful By Liu Xiaosen on October 10, 2008
Format: Hardcover Verified Purchase
The seller honestly ranks the book as "Good".
Actually, it likes a brand new book.
Thank you
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0 of 5 people found the following review helpful By A Customer on June 19, 2000
Format: Paperback
This book is another excellent work from Sze. All the technologically important points have been well covered by Sze. Finally a must have for technologists working and students interested in the field of ULSI.
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