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X-Ray Metrology in Semiconductor Manufacturing
 
 
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X-Ray Metrology in Semiconductor Manufacturing [Hardcover]

D. Keith Bowen (Author), Brian K. Tanner (Author)

Price: $157.95 & this item ships for FREE with Super Saver Shipping. Details
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Book Description

January 24, 2006 0849339286 978-0849339288 1
The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems.

Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text.

Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

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Inside This Book (learn more)
Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
strain dispersion, topological roughness, twist mosaic, height difference function, specular scatter, conformal roughness, beam conditioner, diffuse scatter, microfocus source, polycapillary optic, coupled scan, metrological method, relaxed peak, dislocation bundles, transition between layers, open detector, interface width, asymmetric reflections, specular reflectivity, reciprocal space map, specular peak, relaxed layers, strained silicon, rocking curve, specular condition
Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Plenum Press, X-Ray Anal, American Institute of Physics, Crystal Growth, Durham University, Dynamical Theory of X-Ray Diffraction, Journal of Applied Physics, Oxford University Press, Pergamon Press, Roughness Determination
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